⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3134554 | 1.00 | — | — | |
| SCHEMBL223014 | 0.84 | — | — | |
| SCHEMBL223015 | 0.84 | — | — | |
| SCHEMBL15851485 | 0.83 | — | — | |
| SCHEMBL1428294 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL1428295 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL375106 | 0.78 | — | — | |
| SCHEMBL375107 | 0.78 | — | — | |
| SCHEMBL15851488 | 0.77 | — | — | |
| SCHEMBL28152596 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7642042-B2 | Polymer, top coating layer, top coating composition and immersion lithography process using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-05 | — | — | US | claimed |
| US-20070155925-A1 | Polymer, top coating layer, top coating composition and immersion lithography process using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-05 | — | — | US | claimed |
| US-7642042-B2 | Polymer, top coating layer, top coating composition and immersion lithography process using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-05 | — | — | US | disclosed |
| US-20070155925-A1 | Polymer, top coating layer, top coating composition and immersion lithography process using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-05 | — | — | US | disclosed |
| US-7179413-B1 | Flash-spinning process and solution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-20 | — | — | US | disclosed |
| EP-1208251-B1 | FLASH-SPINNING PROCESS AND SOLUTION | DU PONT (US) | 2003-11-12 | — | — | EP | disclosed |
| EP-1208251-A1 | FLASH-SPINNING PROCESS AND SOLUTION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-05-29 | — | — | EP | disclosed |
| WO-2001014620-A1 | FLASH-SPINNING PROCESS AND SOLUTION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-03-01 | — | — | WO | disclosed |