SCHEMBL3135520

SCHEMBL3135520

C=C(C)C(=O)Oc1ccc(SC)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.56
KMT2A Q03164 4/20 0.51
ATM Q13315 1/20 0.51
RAB9A P51151 1/20 0.39
PLK1 P53350 1/20 0.39
LMNA P02545 2/20 0.38
MAPT P10636 4/20 0.38
CYP1A1 P04798 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP1B1 Q16678 1/20 0.38
POLB P06746 3/20 0.36
NPSR1 Q6W5P4 2/20 0.36
KDM4E B2RXH2 1/20 0.36
NOS3 P29474 2/20 0.36
NOS1 P29475 2/20 0.36
MEN1 O00255 2/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ALDH1A1 P00352 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19540354 0.87 ELANE (0.57) ELANEKMT2AATMRAB9ALMNA
SCHEMBL1232007 0.87 ELANE (0.57) ELANEKMT2AATMRAB9ALMNA
SCHEMBL14173266 0.87 ELANE (0.57) ELANEKMT2AATMRAB9ALMNA
SCHEMBL56436 0.86 ELANE (0.69) ELANEKMT2AATMRAB9ALMNA
SCHEMBL27709032 0.84 ELANE (0.54) ELANEKMT2AATMRAB9ALMNA
SCHEMBL7077201 0.84 ELANE (0.54) ELANEKMT2AATMRAB9ALMNA
SCHEMBL7077981 0.82 ELANE (0.53) ELANEKMT2AATMRAB9ALMNA
SCHEMBL30129653 0.81 ELANE (0.59) ELANEKMT2AATMRAB9ALMNA
SCHEMBL4303407 0.81 ELANE (0.64) ELANEKMT2AATMRAB9ALMNA
SCHEMBL687176 0.81 ELANE (0.51) ELANEKMT2AATMLMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150340246-A1 METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-26 US disclosed
US-20150340246-A1 METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-11-26 US disclosed
EP-2139878-A2 HIGH REFRACTIVE INDEX MONOMERS, COMPOSITIONS AND USES THEREOF BASF SE (DE) 2010-01-06 EP disclosed
WO-2009048262-A2 POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2009-04-16 WO disclosed
WO-2008101806-A2 HIGH REFRACTIVE INDEX MONOMERS, COMPOSITIONS AND USES THEREOF BASF SE (CH) 2008-08-28 WO disclosed
WO-2008101806-A2 HIGH REFRACTIVE INDEX MONOMERS, COMPOSITIONS AND USES THEREOF BASF SE (CH) 2008-08-28 WO disclosed
US-20080200582-A1 High refractive index monomers, compositions and uses thereof CIBA CORP. 2008-08-21 US disclosed
US-20080200582-A1 High refractive index monomers, compositions and uses thereof CIBA CORP. 2008-08-21 US disclosed
US-20080200582-A1 High refractive index monomers, compositions and uses thereof CIBA CORP. 2008-08-21 US disclosed