Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9407358 | 1.00 | ALDH1A1 (0.56) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL1685757 | 0.91 | ALDH1A1 (0.53) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL9407359 | 0.91 | ALDH1A1 (0.53) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL9441615 | 0.88 | ALDH1A1 (0.50) | ALDH1A1TDP1 | |
| SCHEMBL28284070 | 0.88 | ALDH1A1 (0.50) | ALDH1A1TDP1 | |
| SCHEMBL607208 | 0.88 | ALDH1A1 (0.50) | ALDH1A1TDP1 | |
| SCHEMBL4902307 | 0.87 | ALDH1A1 (0.56) | ALDH1A1TP53CYP3A4MGLL | |
| SCHEMBL1809471 | 0.87 | ALDH1A1 (0.59) | ALDH1A1TP53CYP3A4SMN1; SMN2MGLL | |
| SCHEMBL27736583 | 0.84 | SMN1; SMN2 (0.50) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL4890199 | 0.84 | ALDH1A1 (0.53) | ALDH1A1TP53CYP3A4SMN1; SMN2MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4764447-A | UNSATURATED ESTER MONOMER | RICOH CO., LTD. (JP) | 1988-08-16 | — | — | US | claimed |
| US-9566804-B2 | Ink jet recording apparatus and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9278549-B2 | Ink jet recording apparatus and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2016-03-08 | — | — | US | disclosed |
| US-20150210092-A1 | INK JET RECORDING APPARATUS AND INK JET RECORDING METHOD | SEIKO EPSON CORP (JP) | 2015-07-30 | — | — | US | disclosed |
| US-9028057-B2 | Ink jet recording apparatus and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-7686880-B2 | Process for producing pigment complex and pigment-containing composition | CANON KABUSHIKI KAISHA (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20060060109-A1 | dissolving a pigment in a supercritical state or subcritical state fluid and contacting the fluid containing the dissolved pigment with a block or graft copolymer-containing solution; extremely high pigment dispersion stability and have a small and uniform particle size; excellent color purity | CANON KABUSHIKI KAISHA (JP) | 2006-03-23 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-5328794-A | Toner for developing electrostatic latent images | RICOH COMPANY, LTD. (JP) | 1994-07-12 | — | — | US | disclosed |
| US-4764447-A | UNSATURATED ESTER MONOMER | RICOH CO., LTD. (JP) | 1988-08-16 | — | — | US | disclosed |