SCHEMBL31437397

SCHEMBL31437397

N[SiH3].O=c1cc(CO)c2cc(Br)c(O)cc2o1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 8/20 0.69
AKR1B1 P15121 3/20 0.49
CA12 O43570 2/20 0.44
CA1 P00915 2/20 0.44
CA2 P00918 1/20 0.44
CA4 P22748 1/20 0.44
MAOB P27338 1/20 0.44
CA5A P35218 1/20 0.44
CA7 P43166 1/20 0.44
CA5B Q9Y2D0 1/20 0.44
ALDH1A1 P00352 4/20 0.41
HPGD P15428 4/20 0.41
HSD17B10 Q99714 4/20 0.41
CASP1 P29466 3/20 0.41
CASP7 P55210 3/20 0.41
KDM4E B2RXH2 3/20 0.41
CYP3A4 P08684 1/20 0.41
THRB P10828 1/20 0.41
GLA P06280 2/20 0.40
GAA P10253 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30350025 0.95 MCL1 (0.76) MCL1AKR1B1CA12CA1CA2
SCHEMBL7462235 0.95 MCL1 (0.76) MCL1AKR1B1CA12CA1CA2
SCHEMBL13058664 0.83 HSD17B3 (0.58) MCL1AKR1B1ALDH1A1HPGDHSD17B10
SCHEMBL17553159 0.83 MCL1 (0.57) MCL1AKR1B1ALDH1A1HPGDHSD17B10
SCHEMBL8706801 0.82 MCL1 (1.00) MCL1AKR1B1CA12CA1ALDH1A1
SCHEMBL7450481 0.82 MCL1 (0.77) MCL1AKR1B1ALDH1A1HPGDHSD17B10
SCHEMBL14930073 0.81 HSD17B3 (0.63) MCL1AKR1B1ALDH1A1HPGDHSD17B10
SCHEMBL299767 0.77 MCL1 (0.50) MCL1AKR1B1ALDH1A1HPGDKDM4E
SCHEMBL4962429 0.77 MCL1 (0.47) MCL1AKR1B1ALDH1A1HPGDHSD17B10
SCHEMBL6403956 0.76 MCL1 (0.49) MCL1AKR1B1ALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119631019-A Photosensitive surface treatment agent, substrate for pattern formation, laminate, transistor, pattern formation method, and method for manufacturing transistor 株式会社 尼康 2025-03-14 CN disclosed