SCHEMBL3144730

SCHEMBL3144730

CC1CCCCC1(C(=O)O)C(=O)OC(=O)C1(C(=O)O)CCCCC1C

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.34
NPSR1 Q6W5P4 1/20 0.32
MAPT P10636 2/20 0.32
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12822139 0.87 NPSR1 (0.43) CYP2C19NPSR1MAPTCYP4F2CYP4A11
SCHEMBL15519662 0.87 NPSR1 (0.43) CYP2C19NPSR1MAPTCYP4F2CYP4A11
SCHEMBL1063404 0.86 CYP2C19 (0.40) CYP2C19NPSR1MAPT
SCHEMBL29184375 0.81 NPSR1 (0.40) CYP2C19NPSR1MAPTCYP4F2CYP4A11
SCHEMBL988593 0.80 CYP1A2 (0.38) CYP2C19NPSR1
SCHEMBL1247340 0.78 CYP2C19 (0.34) CYP2C19
SCHEMBL11757280 0.76 APLNR (0.31)
SCHEMBL3681913 0.74 CYP2C19 (0.31) CYP2C19MAPT
SCHEMBL9034015 0.73 CYP1A2 (0.34) CYP2C19
SCHEMBL2357465 0.73 KDM4E (0.40) CYP2C19NPSR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110770202-B Active ester resin, and composition and cured product using same DIC株式会社 2022-12-16 CN disclosed
CN-113840885-B Antifouling coating composition 日东化成株式会社 2022-11-15 CN disclosed
CN-109843994-B Sheet-like prepreg 株式会社大赛璐 2022-10-14 CN disclosed
CN-107266661-B Curable resin composition and cured product thereof 株式会社大赛璐 2022-09-02 CN disclosed
CN-114901468-A Laminate, method for producing same, and automotive exterior material 三菱化学株式会社 2022-08-12 CN disclosed
CN-114901752-A UV resistant surfacing material for composite parts 塞特工业公司 2022-08-12 CN disclosed
CN-110770203-B Active ester compound, and composition and cured product using same DIC株式会社 2022-07-15 CN disclosed
CN-114762104-A Underfill film for semiconductor package and method for manufacturing semiconductor package using same 株式会社斗山 2022-07-15 CN disclosed
CN-110483741-B Tetramethyldiphenol type epoxy resin, epoxy resin composition, cured product, and semiconductor encapsulating material 三菱化学株式会社 2022-07-12 CN disclosed
CN-111479889-B Adhesive, laminate, battery packaging material, and battery DIC株式会社 2022-06-07 CN disclosed
US-20090233228-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION ASAHI KASEI EMD CORPORATION (JP) 2009-09-17 US disclosed
US-20090202794-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION ASAHI KASEI EMD CORPORATION (JP) 2009-08-13 US disclosed
EP-2056163-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION Asahi Kasei EMD Corporation (JP) 2009-05-06 EP disclosed
US-7252886-B2 Curable composition and process for producing cured fluorinated product ASAHI GLASS COMPANY, LIMITED (JP) 2007-08-07 US disclosed
US-20060281883-A1 Curable composition and process for producing cured fluorinated product ASAHI GLASS COMPANY LIMITED (JP) 2006-12-14 US disclosed
EP-1724291-A1 CURABLE COMPOSITION AND PROCESS FOR PRODUCING CURED FLUOROCHEMICAL Asahi Glass Company, Limited (JP) 2006-11-22 EP disclosed
US-6645632-B2 Blend of polyimide and epoxy resin SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-11 US disclosed
US-20010031828-A1 Film-type adhesive for electronic components, and electronic components bonded therewith SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-18 US disclosed
US-5854371-A Phosphorus-modified epoxy resin mixtures comprising epoxy resins, phosphorus-containing compounds and a curing agent HOECHST AKTIENGESELLSCHAFT (DE) 1998-12-29 US disclosed
US-5773533-A Epoxy resin reacted with carboxy-functional phosphinic or phosphonic acid and hardener HOECHST AKTIENGESELLSCHAFT (DE) 1998-06-30 US disclosed