SCHEMBL31463175

SCHEMBL31463175

COC(=O)c1ccnc(-c2ccccn2)c1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.71
▸ KDM6B O15054 3/20 0.71
▸ KDM5C P41229 3/20 0.71
▸ KDM4C Q9H3R0 3/20 0.71
▸ KDM2A Q9Y2K7 3/20 0.71
▸ KDM3A Q9Y4C1 3/20 0.71
▸ KDM4A O75164 1/20 0.66
▸ JMJD6 Q6NYC1 2/20 0.62
▸ KDM5B Q9UGL1 1/20 0.60
▸ NPC1 O15118 1/20 0.53
▸ HPGD P15428 1/20 0.53
▸ RAB9A P51151 1/20 0.53
▸ SMN1; SMN2 Q16637 1/20 0.53
▸ TSHR P16473 2/20 0.52
▸ ALOX15 P16050 2/20 0.51
▸ HTT P42858 1/20 0.51
▸ GRM5 P41594 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.50
▸ TGFBR1 P36897 1/20 0.50
▸ POLB P06746 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7033789 1.00 KDM4E (0.71) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL29894587 0.90 KDM4E (0.86) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL70279 0.90 KDM4E (0.86) KDM4EKDM6BKDM5CKDM4CKDM2A
Hydrochloric Acid SCHEMBL6504834 0.88 KDM4E (0.83) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL6514670 0.88 KDM4E (0.83) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL15173149 0.87 KDM4E (0.56) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL5562975 0.84 GRM5 (0.64) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL581398 0.84 KDM4E (0.71) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL2868531 0.83 KDM5C (1.00) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL19229659 0.83 KDM4E (0.76) KDM4EKDM6BKDM5CKDM4CKDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119695101-A Silicon-carbon composite material containing covalent organic framework material coating layer and preparation method thereof 博赛利斯(南京)有限公司 2025-03-25 — — CN disclosed
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