⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11536961 | 0.90 | FFAR3 (0.32) | — | |
| SCHEMBL11536305 | 0.85 | — | — | |
| SCHEMBL11535359 | 0.82 | — | — | |
| SCHEMBL2488949 | 0.73 | FFAR3 (0.31) | — | |
| SCHEMBL28489123 | 0.73 | FFAR3 (0.31) | — | |
| SCHEMBL29031913 | 0.73 | FFAR3 (0.31) | — | |
| SCHEMBL22324 | 0.70 | — | — | |
| SCHEMBL13744568 | 0.70 | — | — | |
| SCHEMBL20581197 | 0.70 | NSD2 (0.39) | — | |
| SCHEMBL22436304 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101495919-B | Positive photosensitive resin composition, method for preparing cured relief pattern, semiconductor device | ASAHI KASEI E MATERIALS CORP | 2015-05-06 | — | — | CN | disclosed |
| US-7687208-B2 | Positive photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7674566-B2 | Positive photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2010-03-09 | — | — | US | disclosed |
| US-20090233228-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | ASAHI KASEI EMD CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090202794-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | ASAHI KASEI EMD CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| CN-101495919-A | Positive photosensitive resin composition | ASAHI KASEI EMD CORP (JP) | 2009-07-29 | — | — | CN | disclosed |
| EP-2056163-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2009-05-06 | — | — | EP | disclosed |
| US-7416822-B2 | Resin and resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2008-08-26 | — | — | US | disclosed |
| US-20070154843-A1 | Resin and resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2007-07-05 | — | — | US | disclosed |
| EP-1707588-A1 | RESIN AND RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-6657031-B1 | Curable; polyepoxide reworkable through thermal decomposition; printed circuits, semiconductors | LOCTITE CORPORATION | 2003-12-02 | — | — | US | disclosed |
| US-4664929-A | ARTIFICIAL SWEETENERS | GENERAL FOODS CORPORATION (US) | 1987-05-12 | — | — | US | disclosed |
| US-4633006-A | ARTIFICIAL SWEETENERS | GENERAL FOODS CORPORATION (US) | 1986-12-30 | — | — | US | disclosed |
| US-4141991-A | Ferrocene derivatives | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-02-27 | — | — | US | disclosed |
| US-4142051-A | Arylaminoimidazoline derivatives | CHEMIE LINZ AKTIENGESELLSCHAFT (AT) | 1979-02-27 | — | — | US | disclosed |
| US-4001218-A | BACTERICIDES | BAYER AKTIENGESELLSCHAFT (DT) | 1977-01-04 | — | — | US | disclosed |
| US-3982011-A | ANTIBIOTICS, ANIMAL GROWTH PROMOTERS | BAYER AKTIENGESELLSCHAFT (DT) | 1976-09-21 | — | — | US | disclosed |
| US-3931153-A | BACTERICIDE | BAYER AKTIENGESELLSCHAFT (DT) | 1976-01-06 | — | — | US | disclosed |