⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3147400 | 0.82 | — | — | |
| SCHEMBL26314650 | 0.80 | — | — | |
| SCHEMBL3148957 | 0.80 | — | — | |
| SCHEMBL4201563 | 0.78 | — | — | |
| SCHEMBL4201559 | 0.78 | — | — | |
| SCHEMBL13743673 | 0.75 | CHRM2 (0.42) | — | |
| SCHEMBL26314735 | 0.73 | THRA (0.39) | — | |
| SCHEMBL26314656 | 0.73 | THRA (0.39) | — | |
| SCHEMBL18635630 | 0.73 | CA1 (0.42) | — | |
| SCHEMBL14087080 | 0.73 | POLB (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106502052-B | Etching-resistant phenolic aldehyde positive photoresist | 潍坊星泰克微电子材料有限公司 | 2020-01-14 | — | — | CN | disclosed |
| US-10289002-B2 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10042247-B2 | Mask blank, method for manufacturing mask blank and transfer mask | HOYA CORPORATION (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20170285460-A1 | MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK | HOYA CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9725618-B2 | Metal-containing resist underlayer film-forming composition containing polyacid | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9645494-B2 | Resist underlayer film forming composition containing low molecular weight dissolution accelerator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160363863-A1 | ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| CN-106019847-A | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2016-10-12 | — | — | CN | disclosed |
| US-20160291470-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM | CHI MEI CORPORATION (TW) | 2016-10-06 | — | — | US | disclosed |
| US-20160251546-A1 | METAL-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYACID | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-01 | — | — | US | disclosed |
| US-9093279-B2 | Thin film forming composition for lithography containing titanium and silicon | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-2735904-A1 | THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON | Nissan Chemical Industries, Ltd. (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140120730-A1 | THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-01 | — | — | US | disclosed |
| EP-2095189-B1 | COMPOSITION FOR FORMING RESIST FOUNDATION FILM CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL IND LTD (JP) | 2013-07-10 | — | — | EP | disclosed |
| US-20100291483-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20100075253-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL INDUSTRIES , LTD. (JP) | 2010-03-25 | — | — | US | disclosed |