Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 7/20 | 0.47 |
| ▸ | CASP2 | P42575 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | FAAH | O00519 | 1/20 | 0.40 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.39 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.39 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 3/20 | 0.39 |
| ▸ | PPARD | Q03181 | 3/20 | 0.39 |
| ▸ | PPARA | Q07869 | 3/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.39 |
| ▸ | HDAC11 | Q96DB2 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.39 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.39 |
| ▸ | TLR2 | O60603 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3347881 | 0.98 | EPHX1 (0.50) | EPHX1CASP2CNR2TSHRALOX15 | |
| SCHEMBL3347896 | 0.87 | CNR2 (0.59) | CNR2ALOX15FAAHPPARGPPARD | |
| SCHEMBL2749483 | 0.84 | EPHX1 (0.48) | EPHX1CASP2CNR2TSHRALDH1A1 | |
| SCHEMBL11098214 | 0.84 | EPHX1 (0.48) | EPHX1CASP2CNR2TSHRALDH1A1 | |
| SCHEMBL29226170 | 0.82 | EPHX1 (0.52) | EPHX1CASP2CNR2FAAHZDHHC20 | |
| SCHEMBL28356569 | 0.82 | EPHX1 (0.52) | EPHX1CASP2CNR2FAAHZDHHC20 | |
| SCHEMBL28353159 | 0.82 | EPHX1 (0.52) | EPHX1CASP2CNR2FAAHZDHHC20 | |
| SCHEMBL4744653 | 0.82 | FAAH (0.48) | EPHX1CASP2CNR2TSHRALDH1A1 | |
| SCHEMBL11299743 | 0.82 | EPHX1 (0.52) | EPHX1CASP2CNR2TSHRALDH1A1 | |
| SCHEMBL28014306 | 0.82 | EPHX1 (0.52) | EPHX1CASP2CNR2FAAHZDHHC20 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101400352-B | Be used for the treatment of and prophylactic compositions and method | IMMUPHARMA FRANCE S.A. (FR) | 2016-01-06 | — | — | CN | disclosed |
| WO-2012030114-A3 | CATHODE ACTIVE MATERIAL FOR SECONDARY BATTERY | 주식회사 엘지화학 (KR) | 2012-05-10 | — | — | WO | disclosed |
| US-7709162-B2 | Photosensitive composition, color filter, and its production method | FUJIFILM CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| CN-101400352-A | Compositions and methods for the treatment and prevention of disease | IMMUPHARMA FRANCE SA (FR) | 2009-04-01 | — | — | CN | disclosed |
| EP-0843218-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20070184366-A1 | DYE CONTAINING CURABLE COMPOSITION, COLOR FILTER, AND PROCESS OF PREPARING COLOR FILTER | FUJIFILM CORPORATION | 2007-08-09 | — | — | US | disclosed |
| US-20070099096-A1 | Dye-containing curable composition, color filter and method of producing thereof | FUJIFILM CORPORATION | 2007-05-03 | — | — | US | disclosed |
| US-7144678-B2 | Capable of forming a high-contrast image without reducing the sensitivity, in which the image-forming layer is improved in the uniformity, and the solubility and dispersibility in a developer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-12-05 | — | — | US | disclosed |
| US-20060251976-A1 | Photosensitive composition, color filter, and its production method | FUJI PHOTO FILM CO., LTD. | 2006-11-09 | — | — | US | disclosed |
| US-7105270-B2 | Fluoroaliphatic group-containing copolymer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-5698369-A | PHOTODECOMPOSABLE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-16 | — | — | US | disclosed |
| US-5691100-A | SEMICONDUCTORS | HOECHST JAPAN LIMITED (JP) | 1997-11-25 | — | — | US | disclosed |
| EP-0633502-A1 | PATTERN FORMING MATERIAL | HOECHST JAPAN LIMITED (JP) | 1995-01-11 | — | — | EP | disclosed |
| US-5376496-A | Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-12-27 | — | — | US | disclosed |
| US-5275908-A | Lithographic plates with chemical resistance or photoresists with heat resistance | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-01-04 | — | — | US | disclosed |
| US-5068163-A | Photosensitive copy material for lithography | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-11-26 | — | — | US | disclosed |
| US-4699867-A | Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-10-13 | — | — | US | disclosed |
| US-4477635-A | Polymeric triarylmethane dyes | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-10-16 | — | — | US | disclosed |
| EP-0012194-B1 | PROCESS FOR THE PREPARATION OF N-CARBOXYALKYL-1-AMINOALKANE DIPHOSPHONIC ACIDS AND CARBOXYALKYLAMINO-PHENYL-METHANE DIPHOSPHONIC ACIDS | Benckiser-Knapsack GmbH (DE) | 1982-02-03 | — | — | EP | disclosed |
| EP-0012194-A1 | Process for the preparation of N-carboxyalkyl-1-aminoalkane diphosphonic acids and carboxyalkylamino-phenyl-methane diphosphonic acids | Benckiser-Knapsack GmbH (DE) | 1980-06-25 | — | — | EP | disclosed |