SCHEMBL315166

SCHEMBL315166

C=C([Si](OC)(OC)OC)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL28228274 0.96
SCHEMBL28861374 0.90
SCHEMBL25196844 0.83
SCHEMBL8637595 0.76
SCHEMBL8640331 0.76
SCHEMBL25179792 0.76
SCHEMBL25173698 0.74
SCHEMBL14327994 0.74
SCHEMBL432980 0.74 ALDH1A1 (0.32)
SCHEMBL28119907 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10323182-B2 Nanocrystal-metal oxide composite, methods of manufacture thereof and articles comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-18 US claimed
EP-2034002-B1 Nanoncrystal-metal oxide composites and preparation method thereof SAMSUNG ELECTRONICS CO LTD (KR) 2013-07-17 EP claimed
EP-2598440-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
EP-2598441-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
WO-2012018598-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION (US) 2012-02-09 WO claimed
WO-2012018596-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION (US) 2012-02-09 WO claimed
US-8092719-B2 Nanocrystal-metal oxide composites and preparation method thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-10 US claimed
US-20100059743-A1 NANOCRYSTAL-METAL OXIDE COMPOSITE, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-03-11 US claimed
WO-2010019125-A1 COMPOSITION AND METHOD TO CHARACTERIZE MEMBRANES' DEFECTS ENERGY MATERIALS CORPORATION (US) 2010-02-18 WO claimed
EP-2034002-A2 Nanoncrystal-metal oxide composites and preparation method thereof Samsung Electronics Co., Ltd. (KR) 2009-03-11 EP claimed
US-20090058264-A1 NANOCRYSTAL-METAL OXIDE COMPOSITES AND PREPARATION METHOD THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-03-05 US claimed
EP-4737516-A1 RUBBER COMPOSITION FOR TIRES, AND TIRE BRIDGESTONE CORPORATION (JP) 2026-05-06 EP disclosed
EP-4737517-A1 RUBBER COMPOSITION FOR TIRE, AND TIRE BRIDGESTONE CORPORATION (JP) 2026-05-06 EP disclosed
EP-4737513-A1 RUBBER COMPOSITION FOR TIRE, AND TIRE BRIDGESTONE CORPORATION (JP) 2026-05-06 EP disclosed
EP-4737515-A1 RUBBER COMPOSITION FOR TIRES, AND TIRE BRIDGESTONE CORPORATION (JP) 2026-05-06 EP disclosed
EP-1679184-A1 LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-07-12 EP disclosed
US-6020408-A BLEND OF ACRYLIC POLYMER AND ORGANOSILICON COMPOUND LINTEC CORPORATION (JP) 2000-02-01 US disclosed
EP-0641820-B1 Organosilicon polymer and process for the preparation thereof TOSHIBA SILICONE (JP) 1998-08-12 EP disclosed
US-5489662-A Process for the preparation of organosilicon polymer TOSHIBA SILICONE CO., LTD. (JP) 1996-02-06 US disclosed
EP-0641820-A1 Process for the preparation of organosilicon polymer TOSHIBA SILICONE CO., LTD. (JP) 1995-03-08 EP disclosed