SCHEMBL3153402

SCHEMBL3153402

CCOCCC=COC=CCCOCC

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3258794 0.91 ALDH1A1 (0.32) ALDH1A1
SCHEMBL9084623 0.83 ALDH1A1 (0.45) ALDH1A1TSHR
SCHEMBL21174467 0.82 HSD17B10 (0.31)
SCHEMBL10384299 0.80
SCHEMBL30290762 0.78 ALDH1A1 (0.33) ALDH1A1
SCHEMBL9162282 0.78 TSHR (0.44) TSHR
SCHEMBL8377738 0.76
SCHEMBL17787225 0.76
SCHEMBL11516365 0.76
SCHEMBL12299453 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110364416-B Substrate cleaning method and cleaning device 细美事有限公司 2023-08-18 CN claimed
EP-2481760-B1 INITIATOR SYSTEM FOR CATIONIC POLYMERIZATION AND POLYMERIZATION METHOD USING SAME CHINA PETROLEUM & CHEM CORP (CN) 2021-05-05 EP claimed
EP-0962470-B1 Production process for polyvinyl ether and catalyst used for the process NIPPON CATALYTIC CHEM IND (JP) 2004-03-24 EP claimed
US-20250101146-A1 OXYETHYLENE CHAIN-CONTAINING POLYMER MARUZEN PETROCHEMICAL CO., LTD. (JP) 2025-03-27 US disclosed
EP-4527859-A1 OXYETHYLENE CHAIN-CONTAINING POLYMER Maruzen Petrochemical Co., Ltd. (JP) 2025-03-26 EP disclosed
EP-4527886-A1 CELL-ADHESIVE COMPOSITION AND POLYMER-COATED MICROPARTICLES Maruzen Petrochemical Co., Ltd. (JP) 2025-03-26 EP disclosed
US-20250064749-A1 CELL-ADHESIVE COMPOSITION AND POLYMER-COATED MICROPARTICLES MARUZEN PETROCHEMICAL CO., LTD. (JP) 2025-02-27 US disclosed
CN-114424381-B Secondary battery and device including the same 株式会社LG新能源 2025-01-24 CN disclosed
EP-3495400-B1 BLOCK COPOLYMER AND SURFACE TREATMENT AGENT USING SAME TOSOH CORP (JP) 2024-08-28 EP disclosed
US-11971660-B2 Cross-linked polymer for resist MARUZEN PETROCHEMICAL CO., LTD. (JP) 2024-04-30 US disclosed
CN-110364416-B Substrate cleaning method and cleaning device 细美事有限公司 2023-08-18 CN disclosed
US-20030232904-A1 Particle composition, recording method, and recording apparatus using the particle composition CANON KABUSHIKI KAISHA (JP) 2003-12-18 US disclosed
EP-1371696-A1 Particle composition, recording method, and recording apparatus using the particle composition Canon Kabushiki Kaisha (JP) 2003-12-17 EP disclosed
US-20020180854-A1 Process for forming image with liquid droplets, image forming apparatus utilizing such process and process for ejecting and projecting liquid droplets CANON KABUSHIKI KAISHA (JP) 2002-12-05 US disclosed
EP-1245396-A2 Process for forming image with liquid droplets, image forming apparatus utilizing such process and process for ejecting and projecting liquid droplets CANON KABUSHIKI KAISHA (JP) 2002-10-02 EP disclosed
EP-0823661-B1 Composition for anti-reflective coating material FUJI PHOTO FILM CO LTD (JP) 2001-07-04 EP disclosed
US-6248500-B1 ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 2001-06-19 US disclosed
US-6090531-A UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2000-07-18 US disclosed
EP-0823661-A1 Composition for anti-reflective coating material FUJI PHOTO FILM CO., LTD. (JP) 1998-02-11 EP disclosed
US-4426438-A Anionic copolymers containing polyvalent metal cations and their use in photographic materials AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1984-01-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250064749-A1 CELL-ADHESIVE COMPOSITION AND POLYMER-COATED MICROPARTICLES EPCAM, ICAM1, H1-10 ALDH1A1 554/4885TSHR 1861/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.