Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL822892 | 0.78 | — | — | |
| SCHEMBL866203 | 0.75 | — | — | |
| SCHEMBL8816362 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL11437995 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL27426933 | 0.74 | — | — | |
| SCHEMBL17070900 | 0.74 | ALDH1A1 (0.52) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL3413032 | 0.73 | TSHR (0.42) | ALDH1A1TSHRTHRB | |
| Trimethylammonium SCHEMBL10802051 | 0.73 | TSHR (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL28886814 | 0.73 | ALDH1A1 (0.41) | ALDH1A1TSHRTHRB | |
| SCHEMBL2712214 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRTHRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8603731-B2 | Resist underlayer film forming composition for electron beam lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-12-10 | — | — | US | disclosed |
| EP-2120095-B1 | USE OF A COMPOSITION FOR FORMING A RESIST LOWER LAYER FILM FOR ELECTRON LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| EP-2120095-A1 | RESIST LOWER LAYER FILM FORMING COMPOSITION FOR ELECTRON LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |