SCHEMBL315795

SCHEMBL315795

O=S(=O)(O)c1ccc(Nc2ccccc2)cc1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SNCA P37840 2/20 0.73
TSHR P16473 2/20 0.62
SMN1; SMN2 Q16637 1/20 0.62
PTPRA P18433 1/20 0.58
PTPRB P23467 1/20 0.58
NSD2 O96028 1/20 0.57
DUSP3 P51452 1/20 0.57
PTPN5 P54829 1/20 0.57
CASP7 P55210 1/20 0.57
CASP6 P55212 1/20 0.57
PTPN11 Q06124 1/20 0.57
L3MBTL1 Q9Y468 3/20 0.56
HSD17B10 Q99714 2/20 0.56
ALDH1A1 P00352 2/20 0.56
ALOX12 P18054 2/20 0.56
ALOX15 P16050 1/20 0.56
PTGS1 P23219 1/20 0.56
SLC6A2 P23975 1/20 0.56
MAPK1 P28482 1/20 0.56
PTGS2 P35354 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9479439 1.00 SNCA (0.73) SNCATSHRSMN1; SMN2PTPRAPTPRB
Diphenylamine SCHEMBL28417536 0.93 TSHR (0.73) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL9154737 0.91 SNCA (0.60) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL9717494 0.89 SNCA (0.76) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL460752 0.89 POLB (0.73) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL460751 0.89 POLB (0.73) SNCATSHRSMN1; SMN2PTPRAPTPRB
Diphenylamine SCHEMBL3206649 0.88 GAA (0.65) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL10791668 0.88 SNCA (0.69) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL11062547 0.88 POLB (0.71) SNCATSHRSMN1; SMN2PTPRAPTPRB
SCHEMBL28968591 0.87 TSHR (0.62) SNCATSHRSMN1; SMN2PTPRAPTPRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 664 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119954991-A High oxygen permeability ionomer with large steric hindrance group, and preparation method and application thereof 武汉大学 2025-05-09 CN claimed
WO-2024128570-A1 METHOD FOR PRODUCING CRYSTALLINE FIBER USING CARBOXYLIC ACID, SULFONIC ACID, PHOSPHORIC ACID, OR ACID SALT DERIVATIVE THEREOF (주)비에이에너지 2024-06-20 WO claimed
US-11807774-B2 Thoroughly modified, functionalized polymeric hard coating material for coatings, methods for synthesizing the same and applications thereof NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) 2023-11-07 US claimed
CN-113004790-B Completely modified functional polymeric hard coating material for coating, synthetic method and application thereof 纳米及先进材料研发院有限公司 2023-02-21 CN claimed
CN-109343734-B Touch pad, handwriting input method and display panel 京东方科技集团股份有限公司 2022-04-12 CN claimed
US-20210189173-A1 THOROUGHLY MODIFIED, FUNCTIONALIZED POLYMERIC HARD COATING MATERIAL FOR COATINGS, METHODS FOR SYNTHESIZING THE SAME AND APPLICATIONS THEREOF NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) 2021-06-24 US claimed
CN-113004790-A Completely modified functional polymeric hard coating material for coating, synthetic method and application thereof 纳米及先进材料研发院有限公司 2021-06-22 CN claimed
CN-108148507-B Polishing composition for fused quartz 清华大学 2020-12-04 CN claimed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-110720463-A Plant growth regulating composition and regulator thereof 陕西大成作物保护有限公司 2020-01-24 CN claimed
EP-1599555-A2 CMP COMPOSITION COMPRISING A SULFONIC ACID AND A METHOD FOR POLISHING NOBLE METALS Cabot Microelectronics Corporation (US) 2005-11-30 EP claimed
US-20050227369-A1 Rapid analysis of functional fluids THE LUBRIZOL CORPORATION, A CORPORATION OF THE STATE OF OHIO (US) 2005-10-13 US claimed
WO-2004076574-A2 CMP COMPOSITION COMPRISING A SULFONIC ACID AND A METHOD FOR POLISHING NOBLE METALS CABOT MICROELECTRONICS CORPORATION (US) 2004-09-10 WO claimed
US-20030224293-A1 Thin film comprising an organic compound dye that can form pits when irradiated with a semiconductor laser beam and an indole-2-vinylene metallocene compound ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 2003-12-04 US claimed
US-20030181142-A1 CMP method for noble metals CABOT MICROELECTRONICS CORPORATION 2003-09-25 US claimed
EP-0778795-B1 LASER IMAGEABLE LITHOGRAPHIC PRINTING PLATES KODAK POLYCHROME GRAPHICS LLC (US) 2003-05-14 EP claimed
US-5500668-A INK JET PRINTING XEROX CORPORATION (US) 1996-03-19 US claimed
EP-0241415-B1 Acid tin-(II)-containing electrolyte SANDOZ AG (CH) 1995-03-08 EP claimed
US-5312541-A Improvements in processes for coloring anodized aluminum and/or aluminum alloys SANDOZ LTD. (CH) 1994-05-17 US claimed
EP-0241415-A1 Acid tin-(II)-containing electrolyte SANDOZ AG (CH) 1987-10-14 EP claimed