Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9907031 | 0.86 | — | — | |
| SCHEMBL22418829 | 0.80 | — | — | |
| SCHEMBL22418827 | 0.78 | — | — | |
| SCHEMBL581028 | 0.77 | LMNA (0.34) | LMNA | |
| SCHEMBL3896758 | 0.76 | — | — | |
| SCHEMBL26454542 | 0.76 | — | — | |
| SCHEMBL438144 | 0.76 | LMNA (0.33) | LMNA | |
| SCHEMBL438143 | 0.76 | LMNA (0.33) | LMNA | |
| SCHEMBL28930399 | 0.74 | LMNA (0.32) | LMNA | |
| SCHEMBL7126575 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107286885-B | Anisotropic conductive adhesive film and preparation method thereof | 新纶科技（常州）有限公司 | 2020-05-19 | — | — | CN | claimed |
| US-4407920-A | XEROGRAPHY | XEROX CORPORATION (US) | 1983-10-04 | — | — | US | claimed |
| CN-117500655-A | Method for producing three-dimensional printed article | 埃肯有机硅美国公司 | 2024-02-02 | — | — | CN | disclosed |
| WO-2021124795-A1 | BRAIN WAVE DETECTION ELECTRODE AND BRAIN WAVE DETECTION SYSTEM | 住友ベークライト株式会社 | 2021-06-24 | — | — | WO | disclosed |
| WO-2021079850-A1 | LAMINATED SHEET, AND LAMINATE | 王子ホールディングス株式会社 | 2021-04-29 | — | — | WO | disclosed |
| EP-2047333-B1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK CO (US) | 2010-03-31 | — | — | EP | disclosed |
| EP-2047333-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2009-04-15 | — | — | EP | disclosed |
| WO-2008013766-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-01-31 | — | — | WO | disclosed |
| CN-1307186-C | Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids | HONEYWELL SPECIALTY CHEMICALS (DE) | 2007-03-28 | — | — | CN | disclosed |
| CN-1662546-A | Silyl alkyl esters of anthracene-and phenanthrene carboxylic acids | HONEYWELL SPECIALTY CHEMICALS (DE) | 2005-08-31 | — | — | CN | disclosed |
| US-4407920-A | XEROGRAPHY | XEROX CORPORATION (US) | 1983-10-04 | — | — | US | disclosed |