⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL712303 | 0.77 | — | — | |
| SCHEMBL7211163 | 0.76 | — | — | |
| SCHEMBL3676073 | 0.71 | — | — | |
| Bicarbonate SCHEMBL6065486 | 0.71 | CA1 (0.71) | — | |
| Bicarbonate SCHEMBL20650 | 0.71 | — | — | |
| Bicarbonate SCHEMBL3629001 | 0.71 | — | — | |
| Bicarbonate SCHEMBL177966 | 0.71 | CA1 (0.71) | — | |
| Bicarbonate SCHEMBL3974066 | 0.71 | CA1 (0.71) | — | |
| Bicarbonate SCHEMBL10831385 | 0.71 | CA1 (0.71) | — | |
| Bicarbonate SCHEMBL968687 | 0.71 | CA1 (0.71) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | claimed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | claimed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | claimed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | claimed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | claimed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | claimed |
| US-20190113845-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-04-18 | — | — | US | claimed |
| EP-1921063-B1 | INDOLE COMPOUND, OPTICAL FILTER AND OPTICAL RECORDING MATERIAL | ADEKA CORP (JP) | 2010-09-01 | — | — | EP | claimed |
| EP-0992512-B1 | Reduced cortisol conjugate | ORTHO CLINICAL DIAGNOSTICS INC (US) | 2005-12-14 | — | — | EP | claimed |
| US-6383766-B1 | FOR USE AS IMMUNOGENS AND HAPTENS; FOR USE IN IMMUNOASSAYS | ORTHO-CLINICAL DIAGNOSTICS, INC. | 2002-05-07 | — | — | US | claimed |
| EP-0690847-A1 | HETEROCYCLIC COMPOUNDS AS PLATELET AGGREGATION INHIBITORS | ZENECA LIMITED (GB) | 1996-01-10 | — | — | EP | claimed |
| US-5453414-A | 2-arylpyrimidines and herbicidal use thereof | ROHM AND HAAS COMPANY (US) | 1995-09-26 | — | — | US | claimed |
| WO-1994022835-A2 | HETEROCYCLIC COMPOUNDS AS PLATELET AGGREGATION INHIBITORS | ZENECA LIMITED (GB) | 1994-10-13 | — | — | WO | claimed |
| WO-1994022834-A1 | HETEROCYCLIC DERIVATIVES AS PLATELET AGGREGATION INHIBITORS | ZENECA LIMITED (GB) | 1994-10-13 | — | — | WO | claimed |
| US-5300477-A | 2-arylpyrimidines and herbicidal use thereof | ROHM AND HAAS COMPANY (US) | 1994-04-05 | — | — | US | claimed |
| EP-0579424-A1 | 2-substituted pyrimidines and herbicidal use thereof | ROHM AND HAAS COMPANY (US) | 1994-01-19 | — | — | EP | claimed |
| US-5272077-A | Method for preparing a covalent conjugate of an oligonucleotide and an enzyme | EASTMAN KODAK COMPANY (US) | 1993-12-21 | — | — | US | claimed |
| US-5254469-A | Oligonucleotide-enzyme conjugate that can be used as a probe in hybridization assays and polymerase chain reaction procedures | EASTMAN KODAK COMPANY (US) | 1993-10-19 | — | — | US | claimed |
| EP-0021695-B1 | NOVEL NONLINEAR OPTICAL MATERIALS AND PROCESSES EMPLOYING DIACETYLENES | UNIVERSITY PATENTS, INC. (US) | 1986-11-12 | — | — | EP | claimed |
| US-4379838-A | Photosensitive photographic recording material comprising a dyed layer | AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) | 1983-04-12 | — | — | US | claimed |