⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7625193 | 1.00 | — | — | |
| SCHEMBL17409701 | 0.89 | EPHX2 (0.31) | — | |
| SCHEMBL16975982 | 0.87 | — | — | |
| SCHEMBL8383500 | 0.86 | SMN1; SMN2 (0.38) | — | |
| SCHEMBL15838935 | 0.85 | TP53 (0.46) | — | |
| SCHEMBL6033814 | 0.83 | ESR1 (0.31) | — | |
| SCHEMBL18377366 | 0.82 | — | — | |
| SCHEMBL23315727 | 0.80 | KDM1A (0.31) | — | |
| SCHEMBL19347187 | 0.80 | MAPK8 (0.31) | — | |
| SCHEMBL12243298 | 0.80 | SMN1; SMN2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8168694-B2 | Ink composition, ink set, ink for inkjet recording, ink set for inkjet recording, and ink cartridge for inkjet recording | FUJIFILM CORPORATION (JP) | 2012-05-01 | — | — | US | disclosed |
| US-8133653-B2 | Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20090023102-A1 | POSITIVE RESIST COMPOSITION FOR FORMING THICK-FILM RESIST, THICK-FILM RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-01-22 | — | — | US | disclosed |