SCHEMBL3170844

SCHEMBL3170844

CCCCCCCCc1nc2cc(Cl)ccc2[nH]1

nearest known ligand 0.64

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.49
KMT2A Q03164 3/20 0.47
MAPT P10636 2/20 0.47
PKM P14618 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
MEN1 O00255 2/20 0.47
KDM4E B2RXH2 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
GPR84 Q9NQS5 4/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL784230 1.00 POLB (0.49) POLBKMT2AMAPTPKMTDP1
SCHEMBL9721067 1.00 POLB (0.49) POLBKMT2AMAPTPKMTDP1
SCHEMBL10336405 0.98 POLB (0.50) POLBKMT2AMAPTPKMTDP1
SCHEMBL9198468 0.94 KMT2A (0.49) POLBKMT2AMAPTPKMTDP1
SCHEMBL784231 0.88 TDP1 (0.59) POLBKMT2AMAPTPKMTDP1
SCHEMBL3170850 0.88 TDP1 (0.59) POLBKMT2AMAPTPKMTDP1
SCHEMBL9721071 0.88 TDP1 (0.59) POLBKMT2AMAPTPKMTDP1
SCHEMBL10030890 0.88 TDP1 (0.49) POLBKMT2ATDP1KDM4E
SCHEMBL10336406 0.87 TDP1 (0.60) POLBKMT2AMAPTPKMTDP1
SCHEMBL10765180 0.85 MAPT (0.50) POLBKMT2AMAPTPKMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5173130-A Immersing copper or alloy to be soldered in an aqueous solution containing a 2-alkylbenzimidazole and an organic acid to form a corrosion and heat resistant protective coating SHIKOKU CHEMICALS CORPORATION (JP) 1992-12-22 US claimed
US-20250215572-A1 SURFACE TREATMENT AGENT FOR COPPER OR COPPER ALLOY SHIKOKU CHEMICALS CORPORATION (JP) 2025-07-03 US disclosed
EP-4506488-A1 SURFACE TREATMENT AGENT FOR COPPER OR COPPER ALLOY Shikoku Chemicals Corporation (JP) 2025-02-12 EP disclosed
WO-2023190263-A1 SURFACE TREATMENT AGENT FOR COPPER OR COPPER ALLOY 四国化成工業株式会社 2023-10-05 WO disclosed
CN-111527593-B Method for manufacturing electronic device 住友电木株式会社 2021-05-04 CN disclosed
CN-111527593-A Method for manufacturing electronic device 住友电木株式会社 2020-08-11 CN disclosed
EP-3188577-B1 METHOD FOR FORMING ORGANIC COATING ON COPPER SURFACE ROHM & HAAS ELECT MAT (US) 2019-01-30 EP disclosed
EP-3188577-A1 METHOD FOR FORMING ORGANIC COATING ON COPPER SURFACE Rohm and Haas Electronic Materials LLC (US) 2017-07-05 EP disclosed
US-20170183783-A1 METHOD FOR FORMING ORGANIC COATING ON COPPER SURFACE ROHM & HAAS ELECT MAT (US) 2017-06-29 US disclosed
EP-2161354-A1 COPPER SURFACE TREATING AGENT AND SURFACE TREATMENT METHOD MEC COMPANY LTD. (JP) 2010-03-10 EP disclosed
US-5173130-A Immersing copper or alloy to be soldered in an aqueous solution containing a 2-alkylbenzimidazole and an organic acid to form a corrosion and heat resistant protective coating SHIKOKU CHEMICALS CORPORATION (JP) 1992-12-22 US disclosed
EP-0428383-A1 Process for surface treatment of copper and copper alloy SHIKOKU CHEMICALS CORPORATION (JP) 1991-05-22 EP disclosed