SCHEMBL3174138

SCHEMBL3174138

SCc1ccc(Cc2ccccc2)cc1

nearest known ligand 0.78

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 5/20 0.78
CALM1 P0DP23 1/20 0.67
LTA4H P09960 2/20 0.50
IDH1 O75874 1/20 0.48
PLA2G10 O15496 1/20 0.46
PLA2G2A P14555 1/20 0.46
LMNA P02545 1/20 0.46
SLC22A2 O15244 1/20 0.45
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
BCL2 P10415 1/20 0.41
BCL2L1 Q07817 1/20 0.41
CYP2C9 P11712 1/20 0.41
HNF4A P41235 1/20 0.41
FOLH1 Q04609 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzenemethanethiol SCHEMBL205 0.88
SCHEMBL635341 0.88 IDO1 (0.58) IDO1CALM1LTA4HIDH1LMNA
Benzenemethanethiol SCHEMBL29855810 0.85
Benzenemethanethiol SCHEMBL28837988 0.85
Benzenemethanethiol SCHEMBL28339653 0.85
Benzenemethanethiol SCHEMBL8897382 0.85
Benzenemethanethiol SCHEMBL7357218 0.85 IDO1 (0.93) IDO1CALM1FOLH1
Benzenemethanethiol SCHEMBL2332621 0.85
Benzenemethanethiol SCHEMBL2431700 0.85
Benzenemethanethiol SCHEMBL28763459 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5162556-A Used for forming a thin metal gold layer or film on a substrate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1992-11-10 US claimed
CN-115135407-A Two-layer seamless capsule with water-soluble composition as inner coating 富士胶囊股份有限公司 2022-09-30 CN disclosed
EP-1341534-B1 COMPOUNDS HAVING FUNGICIDAL ACTIVITY AND PROCESSES TO MAKE AND USE SAME DOW AGROSCIENCES LLC (US) 2010-03-31 EP disclosed
US-5162556-A Used for forming a thin metal gold layer or film on a substrate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1992-11-10 US disclosed