SCHEMBL635341

SCHEMBL635341

SCc1ccc(Cc2ccc(CS)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 6/20 0.58
ALDH1A1 P00352 4/20 0.47
CYP3A4 P08684 3/20 0.47
TSHR P16473 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
ESR1 P03372 1/20 0.47
ESR2 Q92731 1/20 0.47
CALM1 P0DP23 1/20 0.44
MAPK1 P28482 1/20 0.41
HPGD P15428 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
TP53 P04637 1/20 0.38
CYP2C9 P11712 1/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TASP1 Q9H6P5 1/20 0.38
KMT2A Q03164 1/20 0.38
ADRA2A P08913 1/20 0.36
ADRA2B P18089 1/20 0.36
ADRA2C P18825 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL127369 0.89 IDO1 (0.69) IDO1ALDH1A1CYP3A4TSHRTDP1
SCHEMBL3174138 0.88 IDO1 (0.78) IDO1CALM1CYP2C9CA1CA2
SCHEMBL7522646 0.80 IDO1 (0.41) IDO1ALDH1A1CYP3A4TSHRTDP1
SCHEMBL17756329 0.79 IDO1 (0.58) IDO1TSHRLMNAHTT
SCHEMBL17756332 0.79 IDO1 (0.58) IDO1TSHRLMNAHTT
SCHEMBL441726 0.79 IDO1 (0.58) IDO1TSHRLMNAHTT
SCHEMBL1756101 0.76
SCHEMBL4030898 0.74 IDO1 (0.46) IDO1ALDH1A1HPGDSMN1; SMN2HSD17B10
SCHEMBL14899868 0.74 IDO1 (0.52) IDO1ALDH1A1CYP3A4TSHRHPGD
SCHEMBL441314 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
CN-116768847-B Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2025-04-29 CN claimed
CN-119751323-A Preparation method of polythiol compound 益丰新材料股份有限公司 2025-04-04 CN claimed
CN-118684609-A Polythiol compound for avoiding explosion polymerization and material leakage and application thereof 益丰新材料股份有限公司 2024-09-24 CN claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN claimed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN claimed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN claimed
CN-117186057-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-08 CN claimed
CN-116768847-A Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2023-09-19 CN claimed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO claimed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN claimed
US-11377433-B2 Method for producing polyfunctional sulfur-containing epoxy compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-07-05 US claimed
EP-4714937-A1 METHOD FOR PRODUCING TETRAFUNCTIONAL THIOL WITH EPISULFIDE RESIN AS STARTING MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-25 EP disclosed
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US disclosed
CN-116768847-B Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2025-04-29 CN disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF PARG, C5, TAF1 IDO1 3660/4885ALDH1A1 3748/4885CYP3A4 694/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.