Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.40 |
| ▸ | LCK | P06239 | 1/20 | 0.40 |
| ▸ | FYN | P06241 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | THPO | P40225 | 1/20 | 0.31 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL4117451 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Cyclohexane SCHEMBL4116646 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4131404 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4124103 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4128843 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4134914 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL36343 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL1902894 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL5834998 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL1048429 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1904734-B | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD | 2011-03-30 | — | — | CN | claimed |
| CN-1811597-B | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD | 2010-09-22 | — | — | CN | claimed |
| CN-1904734-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-01-31 | — | — | CN | claimed |
| CN-1811596-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | claimed |
| CN-1811597-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | disclosed |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-04-20 | — | — | CN | disclosed |
| CN-1904734-B | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD | 2011-03-30 | — | — | CN | disclosed |
| CN-1811597-B | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD | 2010-09-22 | — | — | CN | disclosed |
| US-20100016520-A1 | RADIATION-CURABLE COMPOSITION FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING MEDIUM | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-01-21 | — | — | US | disclosed |
| CN-1904734-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-01-31 | — | — | CN | disclosed |
| CN-1811596-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | disclosed |
| CN-1811597-A | Light-sensitive resin composite | DONGJIN SEMICHEM CO LTD (KR) | 2006-08-02 | — | — | CN | disclosed |