Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.40 |
| ▸ | LCK | P06239 | 1/20 | 0.40 |
| ▸ | FYN | P06241 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | THPO | P40225 | 1/20 | 0.31 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL4117451 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4131404 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4124103 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4128843 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL4134914 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL36343 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL3175980 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL1902894 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL5834998 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 | |
| Methacrylic Acid SCHEMBL1048429 | 1.00 | TDP1 (0.44) | TDP1FFAR3LCKFYNALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115850596-A | Transparent photosensitive polyimide resin and preparation method and application thereof | 中国科学院化学研究所 | 2023-03-28 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| EP-2028207-A1 | Resin composition for composite material parts | Swancor Industrial Co., Ltd. (TW) | 2009-02-25 | — | — | EP | claimed |
| US-20090048422-A1 | RESIN COMPOSITION FOR COMPOSITE MATERIAL PARTS | SWANCOR INDUSTRIAL CO., LTD. (TW) | 2009-02-19 | — | — | US | claimed |
| CN-120129875-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-119552346-A | Modified polyurethane resin, modified thermosetting resin and preparation method thereof | 解合元(上海)资源再生科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119552416-A | Resin intermediate, low amine value resin intermediate, and preparation method and production system thereof | 解合元(上海)资源再生科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119552345-A | Modified polyurethane resin, semi-cured material, composite material and preparation method thereof | 解合元(上海)资源再生科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119552417-A | Modified polymer, low amine value activated polyurethane, resin intermediate, low amine value resin intermediate and preparation method thereof | 解合元(上海)资源再生科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119552344-A | Modified polymer | 解合元(上海)资源再生科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| WO-2024181377-A1 | SEMICONDUCTOR PACKAGE AND RESIN COMPOSITION FOR SEMICONDUCTOR PACKAGE | 株式会社レゾナック | 2024-09-06 | — | — | WO | disclosed |
| US-6773789-B2 | A RADIATION-CURING RESIN UNDERCOATINGS ON A SUPPORT AND COVERING WITH A MAGNETIC FERROMAGNETIC POWDER LAYER; ELECTROMAGNETICS AND DURABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-10 | — | — | US | disclosed |
| US-20030180578-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2003-09-25 | — | — | US | disclosed |
| US-20030096139-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2003-05-22 | — | — | US | disclosed |
| US-6001535-A | PHOTOSENSITIVE RECORDING MEDIA; PRINTING PLATES | AGFA GEVAERT AG (DE) | 1999-12-14 | — | — | US | disclosed |
| EP-0017151-B1 | COLD CURING MATERIALS FOR DENTAL PURPOSES WITH POLYMERISATION-ACTIVE SULFONES | BAYER AG (DE) | 1984-02-15 | — | — | EP | disclosed |
| US-4148841-A | IRON, COPPER AND ANTIMONU COMPOUNDS | HOOKER CHEMICALS & PLASTICS CORP. (US) | 1979-04-10 | — | — | US | disclosed |
| US-4085165-A | ISOCYANATE PREPOLYMER, VINYL COMPOUND, POLYAMINE OR POLYETHER CURING AGENT | BRIDGESTONE TIRE CO., LTD. (JA) | 1978-04-18 | — | — | US | disclosed |
| US-3983185-A | Halogen containing polyester resins having improved smoke-resistance | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1976-09-28 | — | — | US | disclosed |