⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4266980 | 0.94 | — | — | |
| Lithium Ion SCHEMBL43386 | 0.89 | — | — | |
| SCHEMBL1119349 | 0.89 | — | — | |
| SCHEMBL5246570 | 0.89 | — | — | |
| SCHEMBL2839051 | 0.89 | — | — | |
| SCHEMBL11745139 | 0.89 | LMNA (0.33) | — | |
| Zinc Ion SCHEMBL12477137 | 0.89 | — | — | |
| SCHEMBL586765 | 0.89 | — | — | |
| SCHEMBL12476942 | 0.89 | — | — | |
| SCHEMBL4306434 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7648689-B2 | Process for the production of InP fine particles and InP fine particle dispersion obtained by the process | HOYA CORPORATION (JP) | 2010-01-19 | — | — | US | disclosed |
| US-20080199381-A1 | Process For the Production of Inp Fine Particles and Inp Fine Particle Dispersion Obtained by the Process | TOKUMITSU SHUZO | 2008-08-21 | — | — | US | disclosed |
| EP-1862431-A1 | PROCESS FOR PRODUCTION OF InP MICROPARTICLE AND InP MICROPARTICLE DISPERSION SOLUTION PRODUCED BY THE PROCESS | Hoya Corporation (JP) | 2007-12-05 | — | — | EP | disclosed |