Methyl Alcohol

Methyl Alcohol

SCHEMBL3184397

C1CC2CCC1C2.CO.CO.CO

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.33
HSD17B10 Q99714 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA4 P22748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL28091746 1.00 CYP2C9 (0.33) CYP2C9HSD17B10L3MBTL1CA1CA2
Methyl Alcohol SCHEMBL949195 1.00
Methyl Alcohol SCHEMBL27518558 0.96 CYP2C9 (0.32) CYP2C9
Cyclohexane SCHEMBL28160798 0.92 HSD11B1 (0.34) CYP2C9CA1CA2CA4
Methyl Alcohol SCHEMBL28826787 0.92 HSD11B1 (0.34) CYP2C9CA1CA2CA4
Ethane SCHEMBL27917681 0.86
Methyl Alcohol SCHEMBL27679650 0.86
SCHEMBL3226595 0.85 SLC22A2 (0.31) CYP2C9
SCHEMBL8189 0.85
SCHEMBL1230616 0.85 SLC22A2 (0.31) CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858670-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2010-12-28 US disclosed
US-20100026771-A1 INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2010-02-04 US disclosed
EP-2149457-A2 Inkjet recording method, inkjet recording system, and printed material Fujifilm Corporation (JP) 2010-02-03 EP disclosed
EP-1818374-B1 Photosensitive inkjet ink TOSHIBA TEC KK (JP) 2009-10-07 EP disclosed
US-7473720-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2009-01-06 US disclosed
US-7375145-B2 capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-05-20 US disclosed
EP-1528088-B1 Inkjet ink TOSHIBA TEC KK (JP) 2008-02-27 EP disclosed
US-20070270520-A1 Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound RISO TECHNOLOGIES CORPORATION (JP) 2007-11-22 US disclosed
EP-1818374-A1 Photosensitive inkjet ink Toshiba TEC Kabushiki Kaisha (JP) 2007-08-15 EP disclosed
US-20070185224-A1 PHOTOSENSITIVE INKJET INK KABUSHIKI KAISHA TOSHIBA (JP) 2007-08-09 US disclosed
US-20070101898-A1 Inkjet ink AKIYAMA RYOZO 2007-05-10 US disclosed
EP-1705230-A1 Inkjet-ink Toshiba Tec Kabushiki Kaisha (JP) 2006-09-27 EP disclosed
US-20050113476-A1 Inkjet ink RISO TECHNOLOGIES CORPORATION (JP) 2005-05-26 US disclosed
EP-1528088-A1 Inkjet ink Toshiba Tec Kabushiki Kaisha (JP) 2005-05-04 EP disclosed