SCHEMBL3186993

SCHEMBL3186993

Cc1cc(Cc2cc(C)cc(-c3cccc4[nH]nnc34)c2O)c(O)c(-c2cccc3[nH]nnc23)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.38
HSPA5 P11021 1/20 0.38
CYP2C9 P11712 2/20 0.37
CYP2C19 P33261 2/20 0.37
HIF1A Q16665 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP2D6 P10635 1/20 0.34
HSD17B10 Q99714 1/20 0.34
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
GAA P10253 2/20 0.32
MAPT P10636 2/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
BCHE P06276 1/20 0.32
MGAM O43451 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32
METAP2 P50579 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8802439 0.87
SCHEMBL7808234 0.87 ELANE (0.34) SMN1; SMN2HSD17B10GAAMAPTALDH1A1
SCHEMBL6694194 0.87 GABRA1 (0.43) CYP2C9CYP2C19CYP2D6KMT2AMEN1
SCHEMBL9437954 0.86 KDM4E (0.33) HSD17B10KMT2AMEN1MAPTALDH1A1
SCHEMBL10872653 0.86 BCHE (0.31) BCHE
SCHEMBL31570216 0.85 MEN1 (0.42) SMN1; SMN2KMT2AMEN1GAAMAPT
SCHEMBL11567312 0.85 MEN1 (0.42) SMN1; SMN2KMT2AMEN1GAAMAPT
Iodide SCHEMBL9627651 0.85 BCHE (0.30) BCHE
SCHEMBL31570223 0.85 ELANE (0.36) HSD17B10KMT2AMEN1GAAMAPT
SCHEMBL28888366 0.85 ELANE (0.36) HSD17B10KMT2AMEN1GAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4937348-A Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzotriazolylphenols) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1990-06-26 US claimed
US-4871793-A Polyphenylene sulfide resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis (benzotriazolylphenols) NAKAHARA YUTAKA (JP) 1989-10-03 US claimed
US-4812498-A Polycarbonate resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1989-03-14 US claimed
US-4684679-A DISCOLORATION INHIBITION ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-08-04 US claimed
US-4684680-A BENZOTRIAZOLYL PHENOL STABILIZER ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-08-04 US claimed
US-4681905-A 2,2,6,6-TETRAMETHYLPIPERIDYL COMPOUND, AND AN ALKYLIDENE-BIS-(BENZOTRIAZOLYL PHENYL) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-07-21 US claimed
JP-61113649-A None JP disclosed
JP-61113667-A None JP disclosed
WO-2025047817-A1 NEAR-INFRARED TRANSMISSIVE COMPOSITION AND INK 積水化学工業株式会社 2025-03-06 WO disclosed
US-10676566-B2 Polyarylate and molded article using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-06-09 US disclosed
EP-3239209-B1 POLYARYLATE AND MOLDED ARTICLE USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2019-09-18 EP disclosed
US-20190127520-A1 POLYARYLATE AND MOLDED ARTICLE USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-05-02 US disclosed
US-10202487-B2 Polyarylate and molded article using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-02-12 US disclosed
US-4681905-A 2,2,6,6-TETRAMETHYLPIPERIDYL COMPOUND, AND AN ALKYLIDENE-BIS-(BENZOTRIAZOLYL PHENYL) ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1987-07-21 US disclosed
EP-0188236-A2 Polyacetal resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols) ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-07-23 EP disclosed
JP-S61113667-A THERMOSETTING SYNTHETIC RESIN COATING COMPOSITION WITH IMPROVED LIGHT RESISTANCE ADEKA ARGUS CHEM CO LTD 1986-05-31 JP disclosed
JP-S61113649-A POLYMERIC MATERIAL COMPOSITION WITH IMPROVED LIGHT RESISTANCE ADEKA ARGUS CHEM CO LTD 1986-05-31 JP disclosed
EP-0180992-A2 Stabilizer compositions for synthetic resins imparting improved light stability ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 EP disclosed
EP-0180991-A2 Thermosetting synthetic resin lacquer compositions having improved light stability ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 EP disclosed
EP-0180993-A2 Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzo-triazolylphenols) ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 EP disclosed