SCHEMBL3190835

SCHEMBL3190835

CC(C)(C)OC(=O)COc1cccc(OC(C)(C)C)c1[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.40
MAPT P10636 2/20 0.40
POLB P06746 2/20 0.40
DDB1 Q16531 1/20 0.40
CRBN Q96SW2 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ACLY P53396 3/20 0.38
PTPN1 P18031 1/20 0.36
LMNA P02545 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
GLA P06280 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ALDH1A1 P00352 3/20 0.34
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 1/20 0.34
TSHR P16473 1/20 0.34
KMT2A Q03164 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3189641 0.95 HPGD (0.43) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3190419 0.90 POLB (0.44) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3193992 0.88 HPGD (0.40) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3204931 0.88 DDB1 (0.43) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3194034 0.84 HPGD (0.54) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3192036 0.83 PTPN1 (0.37) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3190242 0.83 HPGD (0.39) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3183450 0.83 MAPT (0.37) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3190154 0.82 PTPN1 (0.36) HPGDMAPTPOLBDDB1CRBN
SCHEMBL30440133 0.82 POLB (0.43) HPGDMAPTPOLBDDB1CRBN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed