SCHEMBL3193992

SCHEMBL3193992

CC(C)(C)OC(=O)COc1cccc(O)c1[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.40
MAPT P10636 2/20 0.40
POLB P06746 2/20 0.40
LMNA P02545 1/20 0.40
DDB1 Q16531 1/20 0.40
CRBN Q96SW2 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ACLY P53396 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.36
GAA P10253 1/20 0.36
PTPN1 P18031 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
GLA P06280 1/20 0.35
ALDH1A1 P00352 3/20 0.34
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 1/20 0.34
TSHR P16473 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3189641 0.92 HPGD (0.43) HPGDMAPTPOLBLMNADDB1
SCHEMBL3190835 0.88 HPGD (0.40) HPGDMAPTPOLBLMNADDB1
SCHEMBL3190419 0.88 POLB (0.44) HPGDMAPTPOLBLMNADDB1
SCHEMBL3204931 0.88 DDB1 (0.43) HPGDMAPTPOLBDDB1CRBN
SCHEMBL3190355 0.82 ACLY (0.40) HPGDMAPTPOLBLMNADDB1
SCHEMBL30440133 0.82 POLB (0.43) HPGDMAPTPOLBLMNADDB1
SCHEMBL3194034 0.81 HPGD (0.54) HPGDMAPTPOLBLMNADDB1
SCHEMBL3192036 0.81 PTPN1 (0.37) HPGDMAPTPOLBLMNADDB1
SCHEMBL30565756 0.81 RXFP1 (0.41) HPGDMAPTPOLBLMNACYP2C9
SCHEMBL3402832 0.81 RXFP1 (0.41) HPGDMAPTPOLBLMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed