SCHEMBL3193883

SCHEMBL3193883

O=C(Cc1ccccc1O)OCCOCCO

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 1/20 0.49
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
ALDH1A1 P00352 1/20 0.47
LMNA P02545 1/20 0.47
MAPT P10636 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
TYR P14679 1/20 0.42
YWHAG P61981 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
HSPA5 P11021 1/20 0.37
TAAR1 Q96RJ0 1/20 0.37
PAM P19021 1/20 0.37
ALOX5 P09917 1/20 0.36
IDO1 P14902 1/20 0.36
SERPINE1 P05121 1/20 0.36
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10627434 0.88 AKR1B1 (0.61) AKR1B1MEN1KMT2AALDH1A1LMNA
Ammonia Solution, Strong SCHEMBL10749863 0.83 AKR1B1 (0.55) AKR1B1MEN1KMT2AALDH1A1LMNA
SCHEMBL19360470 0.81 TDP1 (0.51) MEN1KMT2AALDH1A1LMNAMAPT
SCHEMBL14606350 0.80 AKR1B1 (0.55) AKR1B1MEN1KMT2AALDH1A1LMNA
SCHEMBL533588 0.79 ALDH1A1 (0.58) AKR1B1KMT2AALDH1A1SMN1; SMN2TDP1
SCHEMBL29163653 0.79 AKR1B1 (0.53) AKR1B1MEN1KMT2AALDH1A1LMNA
Water SCHEMBL28002265 0.78 ALDH1A1 (0.56) AKR1B1KMT2AALDH1A1SMN1; SMN2TDP1
SCHEMBL8431889 0.76 TSHR (0.51) AKR1B1MEN1KMT2AALDH1A1LMNA
SCHEMBL26119060 0.76 CTBP2 (0.46) MEN1KMT2AALDH1A1LMNAMAPT
SCHEMBL21455771 0.75 CYP19A1 (0.54) AKR1B1MEN1KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102574951-B (meth) acrylic resin composition DENKI KAGAKU KOGYO KK 2015-06-17 CN claimed
EP-2089440-B1 RADICALLY CURABLE COMPOSITION CONTAINING POLYMERIZABLE MONOMER AND RADICAL FORMER SIKA TECHNOLOGY AG (CH) 2013-12-18 EP claimed
CN-118240424-A Active energy ray-curable composition, method for producing phosphorescent cured product, and phosphorescent molded article 柯尼卡美能达株式会社 2024-06-25 CN disclosed
CN-117545810-A Radiation curable coating composition and substrate coated with the same 巴斯夫涂料有限公司 2024-02-09 CN disclosed
CN-117143480-A Active ray-curable ink, method for forming cured product, and light-storage plate 柯尼卡美能达株式会社 2023-12-01 CN disclosed
CN-116438271-A Laminate and laminate structure 三菱化学株式会社 2023-07-14 CN disclosed
CN-110461768-B Silica particles 株式会社日本触媒 2022-11-29 CN disclosed
CN-103249796-B Manufacture method with adhesion material sheet material of optics adhesion material resin combination, optics adhesion material sheet material, image display device, optics and the manufacture method of image display device 日立化成株式会社 2016-10-05 CN disclosed
CN-105176419-A Optical Adhesive Resin Composition, Optical Adhesive Sheet Using Same, And Image Display Device HITACHI CHEMICAL CO LTD 2015-12-23 CN disclosed
CN-103249797-B Optical adhesive resin composition, optical adhesive sheet using same, and image display device HITACHI CHEMICAL CO.,LTD. (JP) 2015-11-25 CN disclosed
CN-102574951-B (meth) acrylic resin composition DENKI KAGAKU KOGYO KK 2015-06-17 CN disclosed
US-20100028701-A1 Free-radically curable composition comprising polymerizable monomer and free-radical initiator SIKA TECHNOLOGY AG (CH) 2010-02-04 US disclosed
CN-1616523-A Organometallic polymer material and process for preparing the same SANYO ELECTRIC CO (JP) 2005-05-18 CN disclosed