SCHEMBL3203229

SCHEMBL3203229

Cc1cc(OCC(=O)OC(C)(C)C)cc(C)c1[S+](c1ccccc1)c1ccccc1.O=S(=O)([O-])c1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.39
MAPT P10636 4/20 0.38
LMNA P02545 2/20 0.38
POLB P06746 1/20 0.38
CYP2C9 P11712 1/20 0.38
HPGD P15428 1/20 0.38
CYP2C19 P33261 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
PSEN1 P49768 3/20 0.37
PSEN2 P49810 3/20 0.37
APH1B Q8WW43 3/20 0.37
NCSTN Q92542 3/20 0.37
APH1A Q96BI3 3/20 0.37
PSENEN Q9NZ42 3/20 0.37
KAT6A Q92794 5/20 0.37
ACLY P53396 3/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PTPRC P08575 2/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3181764 0.92 PTPN1 (0.38) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3181619 0.90 PSEN1 (0.39) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3191604 0.90 MAPT (0.44) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3193982 0.90 PSEN1 (0.39) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3200027 0.89 PTPN1 (0.40) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3203356 0.87 MAPT (0.46) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3201242 0.87 PSEN1 (0.44) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3200855 0.87 PTPN1 (0.36) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL8645071 0.87 PTPN1 (0.46) PTPN1MAPTLMNAPOLBCYP2C9
SCHEMBL3205019 0.87 PSEN1 (0.46) PTPN1MAPTLMNAPOLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed