SCHEMBL3203356

SCHEMBL3203356

Cc1cc(OCC(=O)OC(C)(C)C)cc(C)c1[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.46
HPGD P15428 3/20 0.46
LMNA P02545 2/20 0.46
POLB P06746 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
PTPN1 P18031 1/20 0.42
PSEN1 P49768 2/20 0.40
PSEN2 P49810 2/20 0.40
APH1B Q8WW43 2/20 0.40
NCSTN Q92542 2/20 0.40
APH1A Q96BI3 2/20 0.40
PSENEN Q9NZ42 2/20 0.40
L3MBTL1 Q9Y468 4/20 0.40
TDP1 Q9NUW8 2/20 0.40
ATM Q13315 1/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
NPC1 O15118 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3203229 0.87 PTPN1 (0.39) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3181619 0.87 PSEN1 (0.39) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3194034 0.87 HPGD (0.54) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3181764 0.86 PTPN1 (0.38) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3205019 0.86 PSEN1 (0.46) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3206660 0.85 MAPT (0.48) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3204415 0.85 PSEN1 (0.43) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3193982 0.85 PSEN1 (0.39) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3200855 0.84 PTPN1 (0.36) MAPTHPGDLMNAPOLBCYP2C9
SCHEMBL3192511 0.84 POLB (0.45) MAPTHPGDLMNAPOLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US claimed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US claimed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US claimed
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed