SCHEMBL3203299

SCHEMBL3203299

CS(=O)(=O)Br.O=[N+]([O-])c1ccc(Br)c(Br)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPRC P08575 3/20 0.48
S100A4 P26447 2/20 0.48
ALDH1A1 P00352 4/20 0.47
CYP3A4 P08684 4/20 0.47
TDP1 Q9NUW8 2/20 0.47
CA2 P00918 4/20 0.46
CA5A P35218 3/20 0.46
TSHR P16473 3/20 0.46
CA12 O43570 3/20 0.46
CA1 P00915 3/20 0.46
CA9 Q16790 3/20 0.46
CA14 Q9ULX7 3/20 0.46
CA3 P07451 2/20 0.46
CA4 P22748 2/20 0.46
CA6 P23280 2/20 0.46
CA7 P43166 2/20 0.46
CA13 Q8N1Q1 2/20 0.46
CA5B Q9Y2D0 2/20 0.46
ACHE P22303 2/20 0.43
BCHE P06276 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3277269 0.88 PTPRC (0.54) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL30317899 0.88 PTPRC (0.54) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL12496253 0.80 ALDH1A1 (0.46) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL30168148 0.77 ALDH1A1 (0.43) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL13021529 0.77 ALDH1A1 (0.43) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL30864252 0.76 CYP19A1 (0.56) ALDH1A1CYP3A4TSHRALOX15APEX1
SCHEMBL30204314 0.76 CYP19A1 (0.45) PTPRCS100A4ALDH1A1CYP3A4TDP1
SCHEMBL1290807 0.76 CYP19A1 (0.56) ALDH1A1CYP3A4TSHRALOX15APEX1
SCHEMBL8661575 0.76 CYP19A1 (0.59) ALDH1A1CYP3A4TSHRALOX15APEX1
SCHEMBL13043154 0.76 POLB (0.53) PTPRCS100A4ALDH1A1CYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7662540-B2 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2010-02-16 US disclosed
US-20080268374-A1 Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-20080118867-A1 Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process ASAHI KASEI E-MATERIALS CORPORATION (JP) 2008-05-22 US disclosed
US-20080113302-A1 Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-05-15 US disclosed
US-20080088813-A1 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2008-04-17 US disclosed
EP-1780599-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION FUJIFILM Corporation (JP) 2007-05-02 EP disclosed
WO-2005109098-A1 PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-11-17 WO disclosed
WO-2005091078-A1 PATTERN FORMING PROCESS AND PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2005-09-29 WO disclosed
WO-2005078776-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-08-25 WO disclosed