Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 5/20 | 0.32 |
| ▸ | CA1 | P00915 | 4/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.32 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16765650 | 0.99 | ATM (0.34) | ATMCA2CA1ALDH1A1MAPT | |
| SCHEMBL4835348 | 0.85 | CA2 (0.38) | CA2CA1 | |
| SCHEMBL4835123 | 0.84 | CA2 (0.34) | CA2CA1ALDH1A1 | |
| SCHEMBL14448183 | 0.84 | ATM (0.42) | ATMALDH1A1MAPTHPGDHTT | |
| SCHEMBL14410627 | 0.84 | ATM (0.42) | ATMALDH1A1MAPTHPGDHTT | |
| SCHEMBL19322850 | 0.84 | ATM (0.42) | ATMALDH1A1MAPTHPGDHTT | |
| SCHEMBL108164 | 0.84 | ATM (0.42) | ATMALDH1A1MAPTHPGDHTT | |
| SCHEMBL13098326 | 0.84 | ATM (0.33) | ATMALDH1A1MAPTHPGDHTT | |
| SCHEMBL4837339 | 0.84 | CA2 (0.41) | CA2CA1 | |
| SCHEMBL4834833 | 0.83 | CA2 (0.36) | CA2CA1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-20150160554-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2015-06-11 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |