Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Trifluoroacetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 3/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL20917785 | 0.90 | CA1 (0.53) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL8464128 | 0.90 | CA1 (0.53) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL14354066 | 0.90 | CA1 (0.53) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL7949096 | 0.90 | CA1 (0.53) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL3199213 | 0.90 | CA4 (0.36) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL4358993 | 0.87 | CA4 (0.38) | CA1CA4CA2 | |
| Trifluoroacetic Acid SCHEMBL9230724 | 0.85 | CA1 (0.47) | CA1CA4 | |
| Trifluoroacetic Acid SCHEMBL9276548 | 0.85 | CA1 (0.47) | CA1CA4 | |
| Trifluoroacetic Acid SCHEMBL10703180 | 0.85 | CA1 (0.47) | CA1CA4 | |
| Trifluoroacetic Acid SCHEMBL14354068 | 0.81 | FFAR3 (0.44) | CA1CA4CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3568444-B1 | INK CONTAINING A SECURITY ELEMENT | THE ROYAL MINT LTD (GB) | 2023-07-05 | — | — | EP | disclosed |
| US-20210277268-A1 | INK CONTAINING A SECURITY ELEMENT | THE ROYAL MINT LTD (GB) | 2021-09-09 | — | — | US | disclosed |
| EP-3568444-A1 | INK CONTAINING A SECURITY ELEMENT | The Royal Mint Limited (GB) | 2019-11-20 | — | — | EP | disclosed |
| WO-2018130827-A1 | INK CONTAINING A SECURITY ELEMENT | THE ROYAL MINT LIMITED (GB) | 2018-07-19 | — | — | WO | disclosed |
| US-7732002-B2 | Method for the fabrication of conductive electronic features | CABOT CORPORATION (US) | 2010-06-08 | — | — | US | disclosed |
| US-20100112195-A1 | METHOD FOR THE FABRICATION OF CONDUCTIVE ELECTRONIC FEATURES | CABOT CORPORATION | 2010-05-06 | — | — | US | disclosed |
| US-7691664-B2 | Low viscosity precursor compositions and methods for the deposition of conductive electronic features | CABOT CORPORATION (US) | 2010-04-06 | — | — | US | disclosed |
| US-20100034986-A1 | Low viscosity precursor compositions and methods for the deposition of conductive electronic features | CABOT CORPORATION (US) | 2010-02-11 | — | — | US | disclosed |
| US-7629017-B2 | Methods for the deposition of conductive electronic features | CABOT CORPORATION (US) | 2009-12-08 | — | — | US | disclosed |
| US-7553512-B2 | Method for fabricating an inorganic resistor | CABOT CORPORATION (US) | 2009-06-30 | — | — | US | disclosed |
| EP-1448725-A2 | LOW VISCOSITY PRECURSOR COMPOSITIONS AND METHODS FOR THE DEPOSITION OF CONDUCTIVE ELECTRONIC FEATURES | Superior Micropowders LLC (US) | 2004-08-25 | — | — | EP | disclosed |
| EP-1444055-A1 | TAPE COMPOSITIONS FOR THE DEPOSITION OF ELECTRONIC FEATURES | Superior Micropowders LLC (US) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180451-A1 | Low viscosity copper precursor compositions and methods for the deposition of conductive electronic features | CABOT CORPORATION | 2003-09-25 | — | — | US | disclosed |
| US-20030175411-A1 | Precursor compositions and methods for the deposition of passive electrical components on a substrate | CABOT CORPORATION | 2003-09-18 | — | — | US | disclosed |
| US-20030161959-A1 | Precursor compositions for the deposition of passive electronic features | CABOT CORPORATION | 2003-08-28 | — | — | US | disclosed |
| US-20030148024-A1 | Low viscosity precursor compositons and methods for the depositon of conductive electronic features | CABOT CORPORATION | 2003-08-07 | — | — | US | disclosed |
| US-20030124259-A1 | Metal precursor compound; and agent that reduces the conversion temperature of said precursor by at least 25 degrees C.; viscosity of at least 1000 centipoise | CABOT CORPORATION | 2003-07-03 | — | — | US | disclosed |
| US-20030108664-A1 | Depositing silver metal precursor into portion of recessed feature, heating to temperature of not greater than 400 degrees C to convert precursor to conductor having resistivity of not greater than 10 times resistivity of metal | CABOT CORPORATION | 2003-06-12 | — | — | US | disclosed |
| WO-2003035279-A1 | TAPE COMPOSITIONS FOR THE DEPOSITION OF ELECTRONIC FEATURES | SUPERIOR MICROPOWDERS LLC (US) | 2003-05-01 | — | — | WO | disclosed |
| WO-2003032084-A2 | LOW VISCOSITY PRECURSOR COMPOSITIONS AND METHODS FOR THE DEPOSITION OF CONDUCTIVE ELECTRONIC FEATURES | SUPERIOR MICROPOWDERS LLC (US) | 2003-04-17 | — | — | WO | disclosed |