4-Vinylphenol

4-Vinylphenol

SCHEMBL3204867

C=C(C=Cc1ccccc1)C(=O)OC(C)(C)C.C=Cc1ccc(O)cc1

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.43
CYP3A4 P08684 3/20 0.43
MAOB P27338 3/20 0.43
MEN1 O00255 3/20 0.43
TDP1 Q9NUW8 3/20 0.43
HSPD1 P10809 2/20 0.43
HSPE1 P61604 2/20 0.43
PKM P14618 2/20 0.43
F3 P13726 2/20 0.43
RAB9A P51151 2/20 0.43
MAPT P10636 2/20 0.43
MAOA P21397 2/20 0.43
NFKB1 P19838 1/20 0.43
NFKB2 Q00653 1/20 0.43
RELA Q04206 1/20 0.43
ALDH2 P05091 1/20 0.43
CYP19A1 P11511 1/20 0.43
CYP1B1 Q16678 1/20 0.43
CA12 O43570 5/20 0.42
CA7 P43166 5/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL397820 0.88 EGFR (0.49) KMT2AMAOBMEN1TDP1HSPD1
4-Vinylphenol SCHEMBL7711593 0.84 MIF (0.42) KMT2ACYP3A4MAOBMEN1TDP1
4-Vinylphenol SCHEMBL7711559 0.84 MIF (0.42) KMT2ACYP3A4MAOBMEN1TDP1
Styrene SCHEMBL7711595 0.84 CYP3A4 (0.41) KMT2ACYP3A4MAOBMEN1TDP1
SCHEMBL5008693 0.83 EGFR (0.42) KMT2AMAOBMEN1TDP1HSPD1
4-Vinylphenol SCHEMBL6253860 0.79 MIF (0.43) KMT2ACYP3A4MAOBMEN1TDP1
4-Vinylphenol SCHEMBL2475223 0.78 MIF (0.46) KMT2AMEN1TDP1F3RAB9A
SCHEMBL1506495 0.78 APP (0.42) KMT2ACYP3A4MAOBMEN1TDP1
4-Vinylphenol SCHEMBL16469331 0.78 CYP3A4 (0.39) KMT2ACYP3A4MAOBMEN1TDP1
4-Vinylphenol SCHEMBL28570873 0.78 MIF (0.50) KMT2AMEN1TDP1PKMF3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9817311-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2017-11-14 US disclosed
US-20160266489-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2016-09-15 US disclosed
US-9417527-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2016-08-16 US disclosed
US-20150048051-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-02-19 US disclosed
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed