4-Vinylphenol

4-Vinylphenol

SCHEMBL16469331

C=C(C=Cc1ccccc1)C(=O)OC1(C)CCCC1.C=Cc1ccc(O)cc1

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.39
KMT2A Q03164 3/20 0.39
MAOB P27338 3/20 0.39
TDP1 Q9NUW8 3/20 0.39
HSPD1 P10809 2/20 0.39
HSPE1 P61604 2/20 0.39
PKM P14618 2/20 0.39
F3 P13726 2/20 0.39
MEN1 O00255 2/20 0.39
MAPT P10636 2/20 0.39
MAOA P21397 2/20 0.39
NFKB1 P19838 1/20 0.39
RAB9A P51151 1/20 0.39
NFKB2 Q00653 1/20 0.39
RELA Q04206 1/20 0.39
ALDH2 P05091 1/20 0.39
CYP19A1 P11511 1/20 0.39
CYP1B1 Q16678 1/20 0.39
CA12 O43570 5/20 0.38
CA7 P43166 5/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL16469229 0.86 CA12 (0.39) CYP3A4KMT2AMAOBTDP1HSPD1
4-Vinylphenol SCHEMBL28670504 0.81 CYP19A1 (0.35) CYP19A1CA12CA7CA9CA14
4-Vinylphenol SCHEMBL3204867 0.78 KMT2A (0.43) CYP3A4KMT2AMAOBTDP1HSPD1
4-Vinylphenol SCHEMBL16469134 0.74 ESR1 (0.36) CYP3A4KMT2AMAOBTDP1HSPD1
SCHEMBL7133495 0.74 ABCG2 (0.39) CYP3A4KMT2AMAOBTDP1HSPD1
SCHEMBL7088233 0.71 FOS (0.40) CYP3A4TDP1MAPTRAB9ACYP1B1
SCHEMBL14844445 0.71 CYP19A1 (0.39) TDP1CYP19A1ALDH1A1
SCHEMBL28106862 0.70 ALDH1A1 (0.52) CYP3A4KMT2AMAOBTDP1HSPD1
SCHEMBL14527796 0.69 CYP19A1 (0.38) CYP3A4KMT2AMEN1MAPTRAB9A
(E)-4-Styrylphenol SCHEMBL28186810 0.68 ALDH1A1 (0.61) CYP3A4KMT2AMAOBTDP1HSPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9817311-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2017-11-14 US disclosed
US-20160266489-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2016-09-15 US disclosed
US-9417527-B2 Resist pattern-forming method, substrate-processing method, and photoresist composition JSR CORPORATION (JP) 2016-08-16 US disclosed
US-20150048051-A1 RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-02-19 US disclosed