SCHEMBL3204874

SCHEMBL3204874

Cc1cc(C)cc([S+](c2ccccc2)c2ccccc2)c1.O=S(=O)([O-])c1c(C(F)(F)F)cc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 2/20 0.37
CYP2C19 P33261 2/20 0.37
CYP2D6 P10635 1/20 0.37
TSHR P16473 1/20 0.37
MAPT P10636 3/20 0.36
MAPK1 P28482 1/20 0.36
FFAR1 O14842 1/20 0.34
CDK1 P06493 1/20 0.34
CCNB1 P14635 1/20 0.34
CCNA2 P20248 1/20 0.34
CDK2 P24941 1/20 0.34
CDK7 P50613 1/20 0.34
CCNH P51946 1/20 0.34
CCNA1 P78396 1/20 0.34
FFAR4 Q5NUL3 1/20 0.34
AVPR2 P30518 1/20 0.33
GPR27 Q9NS67 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3201678 0.88 CYP1A2 (0.41) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3189160 0.86 AVPR2 (0.37) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3191563 0.84 FFAR1 (0.40) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3194657 0.84 CYP1A2 (0.36) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3201110 0.83 CYP1A2 (0.39) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3200047 0.83 CYP1A2 (0.34) MEN1KMT2ACYP1A2CYP3A4CYP2C19
SCHEMBL3192962 0.82 POLQ (0.32) MAPTAVPR2GPR27POLQNPSR1
SCHEMBL3197569 0.79 CA12 (0.31) MEN1KMT2AFFAR4LMNA
SCHEMBL3197933 0.78 POLQ (0.34) FFAR4AVPR2GPR27POLQCES2
SCHEMBL3183550 0.78 KDM4E (0.32) MEN1KMT2ACYP1A2CYP3A4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed