SCHEMBL3197933

SCHEMBL3197933

CCc1cc(CC)c([S+](c2ccccc2)c2ccccc2)c(CC)c1.O=S(=O)([O-])c1c(C(F)(F)F)cc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
POLQ O75417 1/20 0.34
TRPM8 Q7Z2W7 1/20 0.32
FFAR4 Q5NUL3 1/20 0.31
PPARG P37231 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
AVPR2 P30518 1/20 0.31
GPR27 Q9NS67 1/20 0.31
PTGDR2 Q9Y5Y4 1/20 0.30
CES2 O00748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3194036 0.88 POLQ (0.32) POLQTRPM8PTGDR2
SCHEMBL3197629 0.88 POLQ (0.35) POLQTRPM8FFAR4SIGMAR1AVPR2
SCHEMBL3201835 0.86 CYP19A1 (0.38) TRPM8PTGDR2
SCHEMBL3200703 0.85 PTGS1 (0.31)
SCHEMBL3194657 0.81 CYP1A2 (0.36) POLQFFAR4AVPR2GPR27
SCHEMBL3188835 0.81 PTGS2 (0.33)
SCHEMBL3201678 0.81 CYP1A2 (0.41) POLQFFAR4AVPR2GPR27PTGDR2
SCHEMBL3190403 0.80 KAT6A (0.33)
SCHEMBL3204874 0.78 MEN1 (0.37) POLQFFAR4AVPR2GPR27CES2
SCHEMBL3193625 0.77 KMT2A (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed