Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 6/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 4/20 | 0.33 |
| ▸ | DPP9 | Q86TI2 | 4/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12153603 | 0.90 | GAA (0.33) | EPHX2THRBDPP4DPP8DPP9 | |
| SCHEMBL12240734 | 0.87 | DPP8 (0.39) | EPHX2THRBDPP4DPP8DPP9 | |
| SCHEMBL18294129 | 0.86 | ALDH1A1 (0.32) | DPP4 | |
| SCHEMBL12309546 | 0.86 | DPP8 (0.31) | DPP4DPP8DPP9 | |
| SCHEMBL12309568 | 0.86 | ALDH1A1 (0.35) | DPP4GAA | |
| SCHEMBL737596 | 0.85 | ALDH1A1 (0.35) | THRBDPP4GAA | |
| SCHEMBL12309551 | 0.85 | DPP8 (0.32) | DPP8DPP9 | |
| SCHEMBL12170588 | 0.85 | DPP4 (0.33) | DPP4GAA | |
| SCHEMBL14330861 | 0.83 | NPSR1 (0.31) | THRBDPP4 | |
| SCHEMBL22811660 | 0.82 | NPSR1 (0.32) | DPP4DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |