SCHEMBL3205846

SCHEMBL3205846

CC(OCN)OCCOC(C)OCN

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28235400 0.90
SCHEMBL7575239 0.79
SCHEMBL254202 0.78 LMNA (0.35) LMNAALDH1A1
SCHEMBL1535731 0.78 LMNA (0.42) LMNAALDH1A1
Hydrochloric Acid SCHEMBL18059974 0.75 LMNA (0.40) LMNAALDH1A1
SCHEMBL8115227 0.75
SCHEMBL6660160 0.75 LMNA (0.35) LMNA
SCHEMBL15037643 0.73
SCHEMBL3318731 0.73 ODC1 (0.43) LMNA
SCHEMBL891898 0.71 LMNA (0.42) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180241076-A1 NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, LITHIUM ION SECONDARY BATTERY COMPRISING SAME, AND METHOD FOR PRODUCING NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY MITSUI CHEMICALS, INC. (JP) 2018-08-23 US disclosed
EP-3333942-A1 NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, LITHIUM ION SECONDARY BATTERY COMPRISING SAME, AND METHOD FOR PRODUCING NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY Mitsui Chemicals, Inc. (JP) 2018-06-13 EP disclosed
US-20170103777-A1 SUBSTRATE FOR SUSPENSION, PROCESS FOR PRODUCING THE SAME, SUSPENSION FOR MAGNETIC HEAD, AND HARD DISK DRIVE DAI NIPPON PRINTING CO., LTD. (JP) 2017-04-13 US disclosed
US-9564153-B2 Substrate for suspension, process for producing the same, suspension for magnetic head, and hard disk drive DAI NIPPON PRINTING CO., LTD. (JP) 2017-02-07 US disclosed
US-20150079424-A1 SUBSTRATE FOR SUSPENSION, PROCESS FOR PRODUCING THE SAME, SUSPENSION FOR MAGNETIC HEAD, AND HARD DISK DRIVE DAINIPPON PRINTING CO LTD (JP) 2015-03-19 US disclosed
US-8927122-B2 Substrate for suspension, process for producing the same, suspension for magnetic head, and hard disk drive DAI NIPPON PRINTING CO., LTD. (JP) 2015-01-06 US disclosed
US-20120301718-A1 METAL-RESIN COMPOSITE MITSUI CHEMICALS, INC. (JP) 2012-11-29 US disclosed
US-20100047626-A1 SUBSTRATE FOR SUSPENSION, PROCESS FOR PRODUCING THE SAME, SUSPENSION FOR MAGNETIC HEAD, AND HARD DISK DRIVE DAI NIPPON PRINTING CO., LTD. (JP) 2010-02-25 US disclosed