SCHEMBL3208475

SCHEMBL3208475

CNCCCCCC#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21568867 1.00 EPHX1 (0.48)
SCHEMBL3345518 1.00 EPHX1 (0.48)
SCHEMBL21574011 1.00 EPHX1 (0.48)
SCHEMBL3211132 0.97
SCHEMBL97294 0.89
SCHEMBL12849125 0.85 PAOX (0.42)
SCHEMBL26003719 0.80 TSHR (0.40)
SCHEMBL13016325 0.78 GBA1 (0.41)
SCHEMBL3457117 0.78 GBA1 (0.41)
SCHEMBL100110 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8536284-B2 N,N′-dimethyl secondary diamine polymer as epoxy resin curing agent AIR PRODUCTS & CHEMICALS, INC. (US) 2013-09-17 US disclosed
EP-1978050-B1 Curing agent for low temperature cure applications AIR PROD & CHEM (US) 2012-10-03 EP disclosed
EP-1914257-B1 Curing agent for low temperature cure applications AIR PROD & CHEM (US) 2010-12-08 EP disclosed
US-20100119838-A1 Curing Agent For Low Temperature Cure Applications AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-05-13 US disclosed
US-7666954-B2 Epoxy resin amine curing agent of N,N′-dimethyl secondary diamine polymer AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-23 US disclosed
EP-1377579-B1 ACYL AND SULFONYL DERIVATIVES OF 6,9-DISUBSTITUTED 2-(TRANS-1,4-DIAMINOCYCLOHEXYL)-PURINES AND THEIR USE AS ANTIPROLIFERATIVE AGENTS AVENTIS PHARMA INC (US) 2009-03-25 EP disclosed
EP-1978050-A1 Curing agent for low temperature cure applications Air Products and Chemicals, Inc. (US) 2008-10-08 EP disclosed
US-20080194776-A1 Curing agent for low temperature cure applications EVONIK DEGUSSA GMBH (DE) 2008-08-14 US disclosed
EP-1914257-A1 Curing agent for low temperature cure applications Air Products and Chemicals, Inc. (US) 2008-04-23 EP disclosed
US-6790995-B2 BY REDUCTION WITH HYDROGEN AT GIVEN TEMPERATURE AND PRESSURIZATION USING A PALLADIUM-CONTAINING CATALYST ON A SUPPORT; INCREASED OPERATING LIFE OR LONG-TERM STABILITY OF THE CATALYST BASF AKTIENGESELLSCHAFT (DE) 2004-09-14 US disclosed
US-6525223-B2 Reacting nitriles with hydrogen at from at 20-250 degrees C. and pressures of 60-350 bar in the presence of a catalyst of supported rhodium; returning the primary amines separated from the mixtures to the reaction; symmetry BASF AKTIENGESELLSCHAFT (DE) 2003-02-25 US disclosed
US-20020128513-A1 Preparation of secondary amines from nitriles BASF AKTIENGESELLSCHAFT (DE) 2002-09-12 US disclosed
US-20020091194-A1 Preparation of primary and secondary amines from nitriles BASF AKTIENGESELLSCHAFT (DE) 2002-07-11 US disclosed
US-5894074-A Preparation of tertiary amines from nitriles and secondary amines BASF AKTIENGESELLSCHAFT (DE) 1999-04-13 US disclosed
US-5463130-A Preparation of peralkylated amines BASF AKTIENGESELLSCHAFT (DE) 1995-10-31 US disclosed