SCHEMBL3209687

SCHEMBL3209687

CC[Si](Cl)(CC)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2270666 0.82
SCHEMBL2395792 0.73
SCHEMBL2272302 0.71
SCHEMBL2104675 0.71
SCHEMBL7575588 0.71
SCHEMBL2272504 0.69 TSHR (0.32)
SCHEMBL23701032 0.69
SCHEMBL2273487 0.69
SCHEMBL2104639 0.63
SCHEMBL381265 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114075236-B Foamless silicon branched fatty acid ionic liquid surfactant and preparation method thereof 江南大学 2022-10-18 CN claimed
CN-114075236-A Foamless silicon branched fatty acid ionic liquid surfactant and preparation method thereof 江南大学 2022-02-22 CN claimed
CN-111018770-A Preparation method of bazedoxifene oxide 北京鑫开元医药科技有限公司 2020-04-17 CN claimed
CN-119054047-A Lateral gap filling 朗姆研究公司 2024-11-29 CN disclosed
CN-118891698-A Capacitance reduction in semiconductor devices 朗姆研究公司 2024-11-01 CN disclosed
CN-118786512-A Surface inhibited atomic layer deposition 朗姆研究公司 2024-10-15 CN disclosed
CN-118715592-A High pressure inert oxidation and in situ annealing treatments for improving film seam quality and WER 朗姆研究公司 2024-09-27 CN disclosed
CN-118561901-A Compound containing bis ((siloxy) phenyl) methane structure and preparation method and application thereof 南京工业大学 2024-08-30 CN disclosed
CN-118476008-A Method for smoothing sidewall roughness and maintaining recessed structure during dielectric gap filling 朗姆研究公司 2024-08-09 CN disclosed
CN-118435318-A High pressure plasma suppression 朗姆研究公司 2024-08-02 CN disclosed
CN-118414450-A Atomic layer deposition pulse sequence engineering for improved conformality to low temperature precursors 朗姆研究公司 2024-07-30 CN disclosed
EP-0100041-B1 1-SULFO-2-AZETIDINONE DERIVATIVES, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 1986-10-22 EP disclosed
EP-0083039-B1 4-CYANO-2-AZETIDINONES AND PRODUCTION THEREOF Takeda Chemical Industries, Ltd. (JP) 1986-03-19 EP disclosed
US-4560508-A BETA-LACTAMASE INHIBITORS, ANINICROBIAL AGENT, CHEMICAL INTERMEDIATE TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1985-12-24 US disclosed
US-4550105-A BETA-LACTAMASE INHIBITORS, ANTIBIOTICS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1985-10-29 US disclosed
EP-0100041-A1 1-Sulfo-2-azetidinone derivatives, their production and use Takeda Chemical Industries, Ltd. (JP) 1984-02-08 EP disclosed
EP-0093376-A2 1-Sulfo-2-azetidinone derivatives, their production and use Takeda Chemical Industries, Ltd. (JP) 1983-11-09 EP disclosed
EP-0083039-A1 4-Cyano-2-azetidinones and production thereof Takeda Chemical Industries, Ltd. (JP) 1983-07-06 EP disclosed
EP-0053816-A1 1-Sulfo-2-oxoazetidine derivatives, their production and use Takeda Chemical Industries, Ltd. (JP) 1982-06-16 EP disclosed
EP-0053387-A1 Method of preparing 1-sulfo-2-oxoazetidine derivatives and intermediates therefor Takeda Chemical Industries, Ltd. (JP) 1982-06-09 EP disclosed