SCHEMBL2272504

SCHEMBL2272504

CCCC[Si](Cl)(CCCC)C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.32
TDP1 Q9NUW8 1/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2395792 0.82
SCHEMBL2101579 0.78 TSHR (0.32) TSHRTDP1LMNATHRB
SCHEMBL2270666 0.72
SCHEMBL20328587 0.71 TSHR (0.35) TSHRLMNATHRB
SCHEMBL2101633 0.70
SCHEMBL2102101 0.70
SCHEMBL348204 0.69 TSHR (0.40) TSHRTDP1LMNATHRB
SCHEMBL9650624 0.69 TSHR (0.40) TSHRTDP1LMNATHRB
SCHEMBL187377 0.69 TSHR (0.40) TSHRTDP1LMNATHRB
SCHEMBL135253 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-0980870-B1 Process for preparing silanes substituted at position alpha of the silicon atom by a tertiary hydrocarbon group WACKER CHEMIE GMBH (DE) 2001-12-12 EP disclosed
US-6156918-A Process for the preparation of silanes, with a tertiary hydrocarbon group in the a-position relative to the silicon atom WACKER-CHEMIE GMBH (DE) 2000-12-05 US disclosed
EP-0980870-A1 Process for preparing silanes substituted at position alpha of the silicon atom by a tertiary hydrocarbon group Wacker-Chemie GmbH (DE) 2000-02-23 EP disclosed
US-4847159-A Substrates coated with organo-silanes that are sterically-protected E. I. DU PONT DE NEMOURS AND COMPANY (US) 1989-07-11 US disclosed
US-4288603-A Silylated catechol compositions GENERAL ELECTRIC COMPANY (US) 1981-09-08 US disclosed