SCHEMBL3211014

SCHEMBL3211014

CCCCCCCCCCCCCC(C)C(=O)C(C)CCCCCCCCCCCCC

nearest known ligand 0.71

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.71
ACE2 Q9BYF1 1/20 0.57
CA2 P00918 1/20 0.54
GPR84 Q9NQS5 7/20 0.52
FDPS P14324 3/20 0.52
FFAR1 O14842 2/20 0.52
FFAR4 Q5NUL3 1/20 0.52
MAPT P10636 1/20 0.50
LCK P06239 1/20 0.50
PPARD Q03181 1/20 0.50
ZDHHC20 Q5W0Z9 1/20 0.50
ZDHHC2 Q9UIJ5 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3222574 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL3222542 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL3227086 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL4350645 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL2710871 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL1922411 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL1321582 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL3218364 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL3231557 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS
SCHEMBL28042655 1.00 CA1 (0.71) CA1ACE2CA2GPR84FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108355137-A A kind of temperature sensitive phase transformation fatty alcohol mediates parents' drug delivery/controlled release carrier, preparation and its application 河南科技大学 2018-08-03 CN claimed
CN-109477613-A Gas supply device and method for supplying gas 昭和电工株式会社 2019-03-15 CN disclosed
US-20100068480-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same CITICORP NORTH AMERICA, INC., AS AGENT 2010-03-18 US disclosed
US-20090068413-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI 2009-03-12 US disclosed
US-20060275702-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI 2006-12-07 US disclosed
US-20060057495-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI 2006-03-16 US disclosed
EP-0683196-B1 Porous biaxially-oriented film comprising high molecular ethylene/ alpha-olefin copolymer and its use MITSUI CHEMICALS INC (JP) 2003-08-06 EP disclosed
US-20010019811-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI (JP) 2001-09-06 US disclosed
US-5948519-A BATTERY SEPARATOR MITSUI CHEMICALS, INC. (JP) 1999-09-07 US disclosed
EP-0683196-A2 Porous biaxially-oriented film comprising high molecular ethylene/ alpha-olefin copolymer and its use MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-11-22 EP disclosed