⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL265179 | 0.94 | — | — | |
| SCHEMBL248830 | 0.88 | — | — | |
| SCHEMBL60586 | 0.88 | — | — | |
| SCHEMBL12335270 | 0.85 | ALDH1A1 (0.36) | — | |
| SCHEMBL18107428 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL25264251 | 0.82 | — | — | |
| Bromide SCHEMBL8879721 | 0.82 | — | — | |
| SCHEMBL11838722 | 0.78 | — | — | |
| SCHEMBL8130677 | 0.78 | — | — | |
| SCHEMBL24127693 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119219757-A | Production process of melittin | 杭州湃肽生化科技有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119219757-B | Production process of melittin | 杭州湃肽生化科技有限公司 | 2025-09-26 | — | — | CN | disclosed |
| US-20250201578-A1 | STRUCTURES AND METHODS OF FORMING STRUCTURES | ASM IP HOLDING B.V. (NL) | 2025-06-19 | — | — | US | disclosed |
| CN-120164849-A | Structure and method of forming a structure | ASM IP私人控股有限公司 | 2025-06-17 | — | — | CN | disclosed |
| CN-119219757-A | Production process of melittin | 杭州湃肽生化科技有限公司 | 2024-12-31 | — | — | CN | disclosed |
| CN-119219757-A | Production process of melittin | 杭州湃肽生化科技有限公司 | 2024-12-31 | — | — | CN | disclosed |
| US-20240096632-A1 | TRANSITION METAL DEPOSITION PROCESSES AND A DEPOSITION ASSEMBLY | ASM IP HOLDING B.V. (NL) | 2024-03-21 | — | — | US | disclosed |
| CN-117721435-A | Transition metal deposition process and deposition assembly | ASM IP私人控股有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-114031595-B | Photochromic compound and application thereof | 江苏视科新材料股份有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-114031596-B | Dibenzo chromene photochromic compound and application thereof | 江苏视科新材料股份有限公司 | 2023-07-28 | — | — | CN | disclosed |
| US-20060155096-A1 | Thermoplastic polymer, thermoplastic polymer composition, antistatic agent, and resin composition | MITSUI TAKEDA CHEMICALS, INC. (JP) | 2006-07-13 | — | — | US | disclosed |
| CN-1245664-C | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| EP-1541608-A1 | THERMOPLASTIC POLYMER, THERMOPLASTIC POLYMER COMPOSITION, ANTISTATIC AGENT, AND RESIN COMPOSITION | MITSUI TAKEDA CHEMICALS, INC. (JP) | 2005-06-15 | — | — | EP | disclosed |
| CN-1479769-A | Radiation-sensitive refractive index-changeable composition and refractive index changing method | ������ʱ����ʽ���� | 2004-03-03 | — | — | CN | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-6165680-A | Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-12-26 | — | — | US | disclosed |
| US-6103450-A | Photosensitive polymer, dissolution inhibitor and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-08-15 | — | — | US | disclosed |
| US-4902833-A | Bisphosphine dioxides | UNION CARBIDE CHEMICALS AND PLASTICS COMPANY INC. (US) | 1990-02-20 | — | — | US | disclosed |
| US-4564690-A | URANYL ION CAPTURING AGENT | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1986-01-14 | — | — | US | disclosed |