Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.54 |
| ▸ | LCK | P06239 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 8/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.46 |
| ▸ | CDC42 | P60953 | 1/20 | 0.43 |
| ▸ | RAC1 | P63000 | 1/20 | 0.43 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29720904 | 1.00 | PTPN22 (0.54) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL31503137 | 0.91 | PTPN22 (0.45) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL2773224 | 0.85 | CYP1A2 (0.46) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL2770679 | 0.85 | CYP1A2 (0.46) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL29655555 | 0.83 | PTPN22 (0.56) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL3212292 | 0.83 | PTPN22 (0.56) | PTPN22LCKCYP1A2ESR1ESR2 | |
| SCHEMBL9578030 | 0.83 | PTPN22 (0.76) | PTPN22CYP1A2ESR1ESR2HSD17B10 | |
| SCHEMBL1533447 | 0.82 | CYP1A2 (0.57) | CYP1A2ESR1ESR2CYP3A4ALOX15 | |
| Betanaphthol SCHEMBL9499766 | 0.81 | PTPN22 (0.73) | PTPN22CYP1A2ESR1ESR2HSD17B10 | |
| SCHEMBL16265987 | 0.81 | PTPN22 (0.73) | PTPN22CYP1A2ESR1ESR2HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112427015-A | Microporous carbon and preparation method thereof | 杭州肄康新材料有限公司 | 2021-03-02 | — | — | CN | claimed |
| US-4782132-A | Process for producing a copolyester | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-11-01 | — | — | US | claimed |
| CN-110642677-B | Preparation of diaryl derivative, diaryl derivative and application | 浙江工业大学 | 2023-05-26 | — | — | CN | disclosed |
| US-20220089810-A1 | POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-03-24 | — | — | US | disclosed |
| US-20220089811-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-03-24 | — | — | US | disclosed |
| WO-2022045270-A1 | METHOD FOR PURIFYING COMPOUND OR POLYMER | 三菱瓦斯化学株式会社 | 2022-03-03 | — | — | WO | disclosed |
| CN-113302223-A | Film-forming composition, resist composition, radiation-sensitive composition, method for producing amorphous film, method for forming resist pattern, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2021-08-24 | — | — | CN | disclosed |
| CN-113286841-A | Polycyclic polyphenol resin and method for producing polycyclic polyphenol resin | 三菱瓦斯化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| US-20210116813-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-22 | — | — | US | disclosed |
| CN-107430344-B | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2021-03-26 | — | — | CN | disclosed |
| EP-3786710-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-03 | — | — | EP | disclosed |
| EP-0311257-B1 | CHOLESTERIC LIQUID CRYSTAL POLYESTERS | NIPPON OIL CO. LTD. (JP) | 1992-05-06 | — | — | EP | disclosed |
| US-5102979-A | POLYESTER AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI KASEI CORPORATION (JP) | 1992-04-07 | — | — | US | disclosed |
| EP-0404116-A2 | Polyester and process for producing the same | MITSUBISHI KASEI CORPORATION (JP) | 1990-12-27 | — | — | EP | disclosed |
| US-4891418-A | MELT PROCESSABILITY | NIPPON OIL COMPANY, LTD. (JP) | 1990-01-02 | — | — | US | disclosed |
| EP-0311257-A1 | Cholesteric liquid crystal polyesters | NIPPON OIL CO. LTD. (JP) | 1989-04-12 | — | — | EP | disclosed |
| US-4814417-A | Process for producing a liquid crystalline polyester polymer of a cyclohexanedicarboxylic acid and an aromatic diol with pyridine/thionyl chloride catalyst | CHISSO CORPORATION (JP) | 1989-03-21 | — | — | US | disclosed |
| US-4782132-A | Process for producing a copolyester | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-11-01 | — | — | US | disclosed |
| EP-0286444-A2 | Process for producing a liquid crystalline polyester of a cyclohexanedicarboxylic acid and an aromatic diol | Chisso Corporation (JP) | 1988-10-12 | — | — | EP | disclosed |
| US-4064271-A | Emetic tetralones and the use thereof for inducing regurgitation | BURROUGHS WELLCOME CO. (US) | 1977-12-20 | — | — | US | disclosed |