Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.75 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.75 |
| ▸ | HPGD | P15428 | 3/20 | 0.75 |
| ▸ | GAA | P10253 | 3/20 | 0.75 |
| ▸ | GLA | P06280 | 5/20 | 0.54 |
| ▸ | MAOA | P21397 | 2/20 | 0.54 |
| ▸ | CASP1 | P29466 | 2/20 | 0.54 |
| ▸ | CASP7 | P55210 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.54 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.54 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.54 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.54 |
| ▸ | NQO2 | P16083 | 1/20 | 0.54 |
| ▸ | DRD1 | P21728 | 1/20 | 0.54 |
| ▸ | ACHE | P22303 | 1/20 | 0.54 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.54 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.54 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29446776 | 1.00 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL29446754 | 0.90 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL29385771 | 0.90 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL320907 | 0.90 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL321679 | 0.90 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL601351 | 0.88 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL599897 | 0.88 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL600275 | 0.88 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL194341 | 0.88 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAGLA | |
| SCHEMBL320922 | 0.88 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6156870-A | Resin composition which can be cured by application of heat or irradiation of light, film, laminate and production of multilayer wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-12-05 | — | — | US | claimed |
| JP-11209612-A | — | — | None | — | — | JP | disclosed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-20240392048-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | RESONAC CORP (JP) | 2024-11-28 | — | — | US | disclosed |
| WO-2024176305-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-08-29 | — | — | WO | disclosed |
| WO-2024176541-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-08-29 | — | — | WO | disclosed |
| WO-2024135501-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | 株式会社レゾナック | 2024-06-27 | — | — | WO | disclosed |
| WO-2024116513-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-06-06 | — | — | WO | disclosed |
| US-20090231521-A1 | METHOD FOR PRODUCING PARTITION WALL FOR COLOR FILTER, SUBSTRATE WITH PARTITION WALL FOR COLOR FILTER, COLOR FILTER FOR DISPLAY ELEMENT, AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090176914-A1 | Ink, Color Filter, and Method for Manufacturing the same, and Display Device | FUJIFILM CORPORATION (JP) | 2009-07-09 | — | — | US | disclosed |
| US-7517636-B2 | Can shorten developing time and has high stripping property and tent reliability | HITACHI CHEMICAL CO., LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20090040433-A1 | LIQUID CRYSTAL DISPLAY DEVICE AND COLOR FILM PLATE, AND PROCESSES FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20080292993-A1 | PHOTO-CATIONIC POLYMERIZABLE EPOXY RESIN COMPOSITION, LIQUID DISCHARGE HEAD, AND MANUFACTURING METHOD THEREOF | CANON KABUSHIKI KAISHA (JP) | 2008-11-27 | — | — | US | disclosed |
| JP-2004341354-A | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | HITACHI CHEM CO LTD | 2004-12-02 | — | — | JP | disclosed |
| US-20030186166-A1 | Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board | HITACHI CHEMICAL CO., LTD. (JP) | 2003-10-02 | — | — | US | disclosed |
| US-6156870-A | Resin composition which can be cured by application of heat or irradiation of light, film, laminate and production of multilayer wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
| JP-H11209612-A | PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION AND PRODUCTION OF PATTERN BY USING SAME | HITACHI CHEM CO LTD | 1999-08-03 | — | — | JP | disclosed |
| EP-0503076-A1 | PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE ELEMENT | HITACHI CHEMICAL CO., LTD. (JP) | 1992-09-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | KDM4E 575/4885ALDH1A1 3248/4885HPGD 4694/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.