⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5185073 | 0.85 | HMGCR (0.42) | — | |
| SCHEMBL3124505 | 0.80 | — | — | |
| SCHEMBL276069 | 0.79 | TSHR (0.36) | — | |
| SCHEMBL7527248 | 0.76 | HMGCR (0.38) | — | |
| SCHEMBL235075 | 0.74 | — | — | |
| SCHEMBL14986356 | 0.74 | — | — | |
| SCHEMBL15283773 | 0.74 | — | — | |
| SCHEMBL720248 | 0.72 | — | — | |
| SCHEMBL2535364 | 0.72 | ALDH1A1 (0.39) | — | |
| SCHEMBL4058856 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100068480-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | CITICORP NORTH AMERICA, INC., AS AGENT | 2010-03-18 | — | — | US | disclosed |
| US-20090068413-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2009-03-12 | — | — | US | disclosed |
| US-20060275702-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-12-07 | — | — | US | disclosed |
| US-20060057495-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-03-16 | — | — | US | disclosed |
| US-20010019811-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI (JP) | 2001-09-06 | — | — | US | disclosed |