SCHEMBL32173

SCHEMBL32173

Cc1nnn[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL6110378 0.97
Lithium SCHEMBL31110426 0.97
Selenium SCHEMBL31219447 0.97
SCHEMBL6110679 0.83 TDP1 (0.36)
SCHEMBL6109759 0.73 HCAR3 (0.32)
SCHEMBL5839137 0.69
SCHEMBL6905309 0.63
SCHEMBL266223 0.63
SCHEMBL2181483 0.63
Ammonia Solution, Strong SCHEMBL238233 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 12505 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12630931-B2 Roughening solution for rolled copper foil and method for producing roughened copper foil MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-05-19 US claimed
CN-122013188-A One-step etching solution for Cu alloy oxide and preparation method thereof 南京和显达微电子科技有限公司 2026-05-12 CN claimed
US-12492340-B2 Etchant SAMSUNG DISPLAY CO., LTD. (KR) 2025-12-09 US claimed
US-20250361442-A1 ETCHANT COMPOSITION DONGJIN SEMICHEM CO LTD (KR) 2025-11-27 US claimed
US-20250331520-A1 HARMFUL ORGANISM CONTROL COMPOSITION NIPPON SODA CO., LTD. (JP) 2025-10-30 US claimed
US-20250313720-A1 CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE SOULBRAIN CO., LTD. (KR) 2025-10-09 US claimed
US-12384967-B2 Etchant SAMSUNG DISPLAY CO., LTD. (KR) 2025-08-12 US claimed
US-12331239-B2 Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt BASF SE (DE) 2025-06-17 US claimed
CN-114456717-B Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2025-05-30 CN claimed
WO-2025108836-A1 COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF MERCK PATENT GMBH (DE) 2025-05-30 WO claimed
US-4258040-A Cephalosporin compounds MERCK & CO., INC. (US) 1981-03-24 US claimed
US-4206211-A BACTERICIDES FARMITALIA CARLO ERBA S.P.A. (IT) 1980-06-03 US claimed
EP-0008277-A1 Benzopyrano derivatives, pharmaceutical compositions containing them and processes for preparing the compounds and compositions Technobiotic Ltd. (CH) 1980-02-20 EP claimed
US-4171304-A 2-Iodomethylpenams CONNLAB HOLDINGS LIMITED (CA) 1979-10-16 US claimed
US-4169947-A 7β-[[[2-Acylamino]-1,2-dioxoethyl]amino]acyl cephalosporins E. R. SQUIBB & SONS, INC. (US) 1979-10-02 US claimed
US-4097421-A FOAMING AGENT IS A HYDROCARBYL TETRAZOLE, INORGANIC FIBER REINFORCEMENT THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-06-27 US claimed
US-4096330-A BACTERICIDES E. R. SQUIBB & SONS, INC. (US) 1978-06-20 US claimed
US-4060687-A Cephalosporins having a 3-α substituted alkyl grouping MERCK & CO., INC. (US) 1977-11-29 US claimed
US-4012381-A Process for preparing cephalosporins and intermediates SOCIETA' FARMACEUTICI ITALIA S.P.A. (IT) 1977-03-15 US claimed
US-3989696-A 3-Heterothio[(oxyalkyl)thioacetyl]cephalosporin derivatives E. R. SQUIBB & SONS, INC. (US) 1976-11-02 US claimed