Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 6/20 | 0.48 |
| ▸ | CYP19A1 | P11511 | 5/20 | 0.48 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9608681 | 0.84 | CYP19A1 (0.50) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL22999233 | 0.84 | CYP19A1 (0.43) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL14673993 | 0.84 | CYP17A1 (0.50) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL27437399 | 0.84 | CYP19A1 (0.50) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL25142188 | 0.82 | GRIN2D (0.44) | CYP17A1CYP19A1NAAAALDH1A1EPHX1 | |
| SCHEMBL20078523 | 0.81 | CYP19A1 (0.48) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL10613175 | 0.81 | CYP19A1 (0.48) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL6441379 | 0.81 | CYP19A1 (0.48) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL11991223 | 0.81 | CYP19A1 (0.48) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 | |
| SCHEMBL958155 | 0.81 | CYP19A1 (0.48) | CYP17A1CYP19A1NAAANPSR1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8586281-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-19 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |