Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 6/20 | 0.48 |
| ▸ | CYP17A1 | P05093 | 5/20 | 0.48 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14673993 | 0.88 | CYP17A1 (0.50) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL9608681 | 0.84 | CYP19A1 (0.50) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL27437399 | 0.84 | CYP19A1 (0.50) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL11991223 | 0.81 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL10613175 | 0.81 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL3217474 | 0.81 | CYP17A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL20078523 | 0.81 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL4742227 | 0.81 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL6441379 | 0.81 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 | |
| SCHEMBL28529274 | 0.80 | CYP19A1 (0.42) | CYP19A1CYP17A1NAAANPSR1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116615405-A | Compound, polymer, composition for film formation, method for forming pattern, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2023-08-18 | — | — | CN | disclosed |
| CN-108137478-B | Compound, composition thereof, purification method, resist pattern formation method, and amorphous film production method | 三菱瓦斯化学株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-107533291-B | Compound, resist composition, and resist pattern formation method using same | 三菱瓦斯化学株式会社 | 2021-06-11 | — | — | CN | disclosed |
| CN-112424283-A | Composition for forming optical member, compound and resin | 三菱瓦斯化学株式会社 | 2021-02-26 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| WO-2020226150-A1 | COMPOUND AND PRODUCTION METHOD THEREOF, RESIN, COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, UNDERLAYER FILM FOR LITHOGRAPHY, OPTICAL COMPONENT, AND METHOD FOR PURIFYING COMPOUND OR RESIN | 学校法人 関西大学 | 2020-11-12 | — | — | WO | disclosed |
| CN-111615507-A | Compound, resin, composition, and pattern forming method | 三菱瓦斯化学株式会社 | 2020-09-01 | — | — | CN | disclosed |
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-104995559-B | Resist composition, resist pattern forming method, and polyphenol derivative used therefor | 三菱瓦斯化学株式会社 | 2020-04-07 | — | — | CN | disclosed |
| WO-2020027206-A1 | OPTICAL COMPONENT-FORMING COMPOSITION, OPTICAL COMPONENT, COMPOUND, AND RESIN | 三菱瓦斯化学株式会社 | 2020-02-06 | — | — | WO | disclosed |
| US-9244349-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20110008728-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100310985-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-09 | — | — | US | disclosed |