⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3220009 | 1.00 | — | — | |
| SCHEMBL2051949 | 0.75 | — | — | |
| SCHEMBL10803815 | 0.75 | — | — | |
| SCHEMBL510865 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL510866 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL8481183 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL129187 | 0.66 | — | — | |
| SCHEMBL487229 | 0.65 | — | — | |
| SCHEMBL6685454 | 0.63 | — | — | |
| SCHEMBL6685451 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100068480-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | CITICORP NORTH AMERICA, INC., AS AGENT | 2010-03-18 | — | — | US | disclosed |
| US-20090068413-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2009-03-12 | — | — | US | disclosed |
| US-20060275702-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-12-07 | — | — | US | disclosed |
| US-20060057495-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-03-16 | — | — | US | disclosed |
| US-20010019811-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI (JP) | 2001-09-06 | — | — | US | disclosed |